High-reflectivity dense multilayer coatings were produced for the ultraviolet spectral region. Thin-film single layers and UV mirrors were deposited by ion plating and plasma ion-assisted deposition high- energetic technologies. Optical characterizations of HfO2 and SiO2 single layers are made. The optical constants obtained for these two materials are presented. HfO2 and SiO2 mirrors with a reflectance of ~99% near 250 nm are reported
Tuning ion energies in plasma-enhanced atomic layer deposition (PEALD) processes enables fine contro...
Tuning ion energies in plasma-enhanced atomic layer deposition (PEALD) processes enables fine contro...
The main goal of this research was to examine the possibility of applying ion beam sputtering method...
Growing requirements for the optical and environmental stability, as well as the radiation resistanc...
Growing requirements on the optical and enviromnental stability as well as on the radiation resistan...
HfO2 is one of the most important high index thin film materials for the manufacture of interference...
Tuning ion energies in plasma-enhanced atomic layer deposition (PEALD) processes enables fine contro...
Thin films of hafnium oxide have been grown by high pressure reactive sputtering on transparent quar...
Thin films of hafnium oxide ( HfO2) have been grown by high pressure reactive sputtering on transpar...
Absorption losses and laser-induced damage threshold (LIDT) are considered to be the major constrain...
Abstract: This paper reports the process parameters used to make moisture stable HfO2, the optical p...
This paper presents approaches to achieve high reflective metal mirrors from 1064 nm-the near infrar...
Material mixtures offer new possibilities for synthesizing coating materials with tailored optical a...
Tuning ion energies in plasma-enhanced atomic layer deposition (PEALD) processes enables fine contro...
Tuning ion energies in plasma-enhanced atomic layer deposition (PEALD) processes enables fine contro...
Tuning ion energies in plasma-enhanced atomic layer deposition (PEALD) processes enables fine contro...
Tuning ion energies in plasma-enhanced atomic layer deposition (PEALD) processes enables fine contro...
The main goal of this research was to examine the possibility of applying ion beam sputtering method...
Growing requirements for the optical and environmental stability, as well as the radiation resistanc...
Growing requirements on the optical and enviromnental stability as well as on the radiation resistan...
HfO2 is one of the most important high index thin film materials for the manufacture of interference...
Tuning ion energies in plasma-enhanced atomic layer deposition (PEALD) processes enables fine contro...
Thin films of hafnium oxide have been grown by high pressure reactive sputtering on transparent quar...
Thin films of hafnium oxide ( HfO2) have been grown by high pressure reactive sputtering on transpar...
Absorption losses and laser-induced damage threshold (LIDT) are considered to be the major constrain...
Abstract: This paper reports the process parameters used to make moisture stable HfO2, the optical p...
This paper presents approaches to achieve high reflective metal mirrors from 1064 nm-the near infrar...
Material mixtures offer new possibilities for synthesizing coating materials with tailored optical a...
Tuning ion energies in plasma-enhanced atomic layer deposition (PEALD) processes enables fine contro...
Tuning ion energies in plasma-enhanced atomic layer deposition (PEALD) processes enables fine contro...
Tuning ion energies in plasma-enhanced atomic layer deposition (PEALD) processes enables fine contro...
Tuning ion energies in plasma-enhanced atomic layer deposition (PEALD) processes enables fine contro...
The main goal of this research was to examine the possibility of applying ion beam sputtering method...