Photochemisch und/oder thermisch strukturierbare Harze auf Silanbasis, einstufiges Verfahren zu deren Herstellung, dabei einzetzbare Ausgangsverbindungen und Herstellungsverfahren fuer diese

WO2003031499 A UPAB: 20030910 NOVELTY - Photochemically- and/or thermally-structurable silane resins are obtained by condensation of a mixture of: (a) alkylsilanes with polymerizable organic group(s) and leaving group(s); and (b) silanediols with alkyl groups and/or polymerizable groups other than those containing aryl residues. DETAILED DESCRIPTION - Photochemically- and/or thermally-structurable silane resins (SR) are obtained by at least partial condensation of a mixture containing: (a) silane compound(s) of formula (I); and (b) silanediol(s) of formula (II). R = a group which undergoes photochemically- and/or thermally-induced radical or cationic polymerization of an organic residue; R2 = optionally substituted, linear, branched or cyclic 1-12C alkyl; X = a leaving group; a = 1 or 2; b = 0 or 1; (a+b) = not more than 2; and R1 = as for R2, or a polymerizable group (as defined for R) other than a group containing an aryl residue. INDEPENDENT CLAIMS are also included for (1) a method for the production of (SR) by condensation of a mixture of (I) and (II) in the presence of an essentially anhydrous solvent or suspension agent; (2) at least partly condensed and polymerized hybrid polymers obtained from SR; (3) a method for the production of (II) by controlled hydrolysis of the corresponding di-(1-6C alkoxy)-silanes, especially the dimethoxy, diethoxy, di-(n- or iso-propoxy) or di-isobutoxy compounds; (4) a method for the production of (II) by controlled hydrolysis of the corresponding difluoro-, dichloro- or dibromo-silanes in the presence of a stoichiometric amount of trialkylamine; (5) silanediols (II) with defined values of R2. USE - For the production of optionally structured, at least partly condensed and polymerized (via organic groups) hybrid polymers (claimed). Applications include multi-layer systems in high-frequency sequential build-up techniques, multi-layer thin-film circuits, photoresists and insulating materials for micro systems. ADVANTAGE - Structurable silane resins with a dielectric constant of less than 3 and a dielectric loss factor of less than 0.005 in the high-frequency range (particularly 10-100 GHz), combined with thermal, mechanical and adhesion properties superior to those of pure organic materials as used for HF applications