Vorrichtung zur Erzeugung eines gepulsten Plasmas innerhalb einer Vakuumkammer mittels eines Festkoerpertargets, mit mindestens einer Debris-Blende

DE 10233567 A UPAB: 20040324 NOVELTY - The device has at least one rotating debris stop (1,1') arranged between an optical element (2,3) or substrate and the plasma (7) in the vacuum chamber. A channel (4) for electromagnetic radiation (5,6) or plasma constituents forming a coating on a substrate with a defined cross-sectional profile over its entire length is present on the stop and the rotation axis of the debris stop is orthogonal to the longitudinal axis of the channel. USE - For generating a pulsed plasma in a vacuum chamber with a solid state target. ADVANTAGE - Enables effective, inexpensive protection of optical elements or substrate surfaces to be coated against debris radiation and intensity losses of electromagnetic radiation to be kept low