Verfahren zur temperaturgeregelten Prozessierung von Substraten

DE 10325602 B UPAB: 20041001 NOVELTY - The temperature regulated radiation furnace (1) incorporates a quartz tube (7) with a support allowing gas to circulate round both sides of a substrate (6) undergoing treatment. It has a gas inlet (9) at one end and a door (5) at the other end. DETAILED DESCRIPTION - There is an inspection window (11) in the tube adjacent to the substrate. The quartz tube is surrounded by a heating coil (4) inside an insulating housing (3). An inspection opening (12) in the insulating housing allows a pyrometer (13) to look through the inspection window and register the temperature of the substrate. USE - Furnace for heat treatment of substrates, including thick film contacts for solar cells, in controlled atmosphere. ADVANTAGE - Pyrometer directly monitors IR given off by electronic substrate under treatment for accurate control of temperature