Add to ORKGHigh power pulsed magnetron sputtering has been used for depositing Al-doped ZnO films from metallic targets in a reactive process. A new type of process control has been developed in order to stabilize the discharge in the transition region. It has been shown that the process can be stabilized for all operating points at high peak power densities. The discharge characteristics like peak power density and plasma impedance have been analyzed. Films have been deposited at room temperature and 200 °C and resistivities below 400 µOcm have been obtained
For the deposition of dielectric thin films Pulsed Magnetron Sputtering (PMS) has become a relevant ...
This study is on the up scaling of the reactive mid frequency (MF) magnetron sputter deposition of z...
This study is on the development of new, economic transparent and conductive oxide layers by reactiv...
High power pulsed magnetron sputtering has been used for depositing Al-doped ZnO films from metallic...
Aluminum doped zinc oxide (AZO) films have been deposited using reactive high power impulse magnetro...
Aluminum doped zinc oxide (AZO) films have been deposited using reactive high power impulse magnetro...
Aluminum-doped zinc oxide (AZO) lms were deposited on glass substrates at 300 C by reactive mid-freq...
Aluminum-doped zinc oxide (AZO) films were deposited on soda-lime glass substrates at 300 °C by reac...
A new coating technology has been developed for large area deposition of transparent and conductive ...
A new coating technology has been developed for large area deposition of transparent and conductive ...
High power pulsed magnetron sputtering (HPPMS) has been used in order to study the deposition of tra...
AbstractSputtering plasma state intensely depends on the variation of deposition parameters. It resu...
Aluminum-doped zinc oxide films are promising candidates for economic transparent conducting oxide (...
Aluminum doped ZnO layers have been prepared by reactive d.c. magnetron sputtering from Zn Al 2 wt....
With the demand of a low cost and high quality TCO layer in thin films solar cell applications the n...
For the deposition of dielectric thin films Pulsed Magnetron Sputtering (PMS) has become a relevant ...
This study is on the up scaling of the reactive mid frequency (MF) magnetron sputter deposition of z...
This study is on the development of new, economic transparent and conductive oxide layers by reactiv...
High power pulsed magnetron sputtering has been used for depositing Al-doped ZnO films from metallic...
Aluminum doped zinc oxide (AZO) films have been deposited using reactive high power impulse magnetro...
Aluminum doped zinc oxide (AZO) films have been deposited using reactive high power impulse magnetro...
Aluminum-doped zinc oxide (AZO) lms were deposited on glass substrates at 300 C by reactive mid-freq...
Aluminum-doped zinc oxide (AZO) films were deposited on soda-lime glass substrates at 300 °C by reac...
A new coating technology has been developed for large area deposition of transparent and conductive ...
A new coating technology has been developed for large area deposition of transparent and conductive ...
High power pulsed magnetron sputtering (HPPMS) has been used in order to study the deposition of tra...
AbstractSputtering plasma state intensely depends on the variation of deposition parameters. It resu...
Aluminum-doped zinc oxide films are promising candidates for economic transparent conducting oxide (...
Aluminum doped ZnO layers have been prepared by reactive d.c. magnetron sputtering from Zn Al 2 wt....
With the demand of a low cost and high quality TCO layer in thin films solar cell applications the n...
For the deposition of dielectric thin films Pulsed Magnetron Sputtering (PMS) has become a relevant ...
This study is on the up scaling of the reactive mid frequency (MF) magnetron sputter deposition of z...
This study is on the development of new, economic transparent and conductive oxide layers by reactiv...