In this paper, the authors present a new approach to residual stress measurement that takes advantage of the combined imaging-milling capabilities of focused ion-beam equipment. The method is based on the measurement of the displacement field originated when a slot of a few microns is milled on the material under study. The fitting of the experimental results with an analytical model together with the independent determination of Young's modulus allows us to find the residual stress of the layer under study. The complete experimental procedure is described and its feasibility is demonstrated on a LPCVD silicon nitride micromachined membrane. Values obtained by this new method show a good agreement with values obtained by a classical method ...
"We present a new procedure for the determination of surface elastic residual stress by instrumented...
Residual stresses in semiconductor and MEMS devices superposing functional and environmental loading...
Integration of micro and nano devices causes several new reliability issues to be analyzed and solve...
A new approach to the local measurement of residual stress in microstructures is described in this p...
A new approach to the local measurement of residual stress in microstructures is described in this p...
The use of a focused ion beam equipment is reported to find out the in-plane residual stress value o...
The paper comprises research results obtained for stress determination on micro and nanotechnology c...
Research results obtained for local stress determination on micro and nanotechnology components are ...
"Residual stress evaluation in thin films at the sub-micron scale was achieved in the present study ...
In this paper, a new approach is presented for local residual stress measurement in MEMS structures....
The paper presents a recently developed method of measuring frozen elastic stresses in micro compone...
In this report, an optimised method for residual stress determination at the microscopic scale is pr...
A new approach to the local measurement of residual stress in microstructures is described in this p...
The residual stress of thin films during the deposition process can cause the components to have unp...
In the present study, residual stress evaluation in thin films was achieved using a semi-destructive...
"We present a new procedure for the determination of surface elastic residual stress by instrumented...
Residual stresses in semiconductor and MEMS devices superposing functional and environmental loading...
Integration of micro and nano devices causes several new reliability issues to be analyzed and solve...
A new approach to the local measurement of residual stress in microstructures is described in this p...
A new approach to the local measurement of residual stress in microstructures is described in this p...
The use of a focused ion beam equipment is reported to find out the in-plane residual stress value o...
The paper comprises research results obtained for stress determination on micro and nanotechnology c...
Research results obtained for local stress determination on micro and nanotechnology components are ...
"Residual stress evaluation in thin films at the sub-micron scale was achieved in the present study ...
In this paper, a new approach is presented for local residual stress measurement in MEMS structures....
The paper presents a recently developed method of measuring frozen elastic stresses in micro compone...
In this report, an optimised method for residual stress determination at the microscopic scale is pr...
A new approach to the local measurement of residual stress in microstructures is described in this p...
The residual stress of thin films during the deposition process can cause the components to have unp...
In the present study, residual stress evaluation in thin films was achieved using a semi-destructive...
"We present a new procedure for the determination of surface elastic residual stress by instrumented...
Residual stresses in semiconductor and MEMS devices superposing functional and environmental loading...
Integration of micro and nano devices causes several new reliability issues to be analyzed and solve...