Impurities can be incorporated during thin film deposition, but also can originate from atmosphere exposure. As impurities can strongly affect the composition-structure-property relations in magnetron sputter deposited thin films, it is important to distinguish between both incorporation channels. Therefore, the impurity incorporation by atmosphere exposure into sputtered Mg, Al, and Ca thin films is systematically studied by a variation of the deposition temperatures and atmosphere exposure times. Deposition temperature variation results in morphological modifications explained by considering surface and bulk diffusion as well as grain boundary motion and evaporation. The film morphologies exhibiting the lowest oxygen concentrations, as me...
International audiencen this work, AlNxOy thin films were deposited by reactive magnetron sputtering...
ABSTRACT The coating process using magnetron sputtering technique is widely used to create metal and...
temperature could be independently controlled due to the low deposition rate of the aluminium. The d...
Impurities can be incorporated during thin film deposition, but also can originate from atmosphere e...
Magnetron sputter deposition was applied to grow thin metal films in the presence of impurities. The...
There is an increasing need to control the microstructure in thin sputtered Ta films for application...
Here we present our study of the stress dependence in Al thin films on deposition conditions. We con...
Here we present our study of the stress dependence in Al thin films on deposition conditions. We con...
The present study investigates the effect of deposition temperature (ambient and liquid N2 temperatu...
The magnetron sputter deposition of metallic thin films usually requires high vacuum sputtering cond...
The influence of the composition on the crystallographic properties of deposited Mg(M)O (with M=Al, ...
The present study investigates the effect of deposition temperature (ambient and liquid N-2 temperat...
Abstract : The purpose of this research was to prepare, investigate and understand the characteristi...
The energy available for an adatom diffusing on the substrate surface is an important parameter with...
DC reactive magnetron sputtering was applied to deposit mixed oxide thin films. To modify the stoich...
International audiencen this work, AlNxOy thin films were deposited by reactive magnetron sputtering...
ABSTRACT The coating process using magnetron sputtering technique is widely used to create metal and...
temperature could be independently controlled due to the low deposition rate of the aluminium. The d...
Impurities can be incorporated during thin film deposition, but also can originate from atmosphere e...
Magnetron sputter deposition was applied to grow thin metal films in the presence of impurities. The...
There is an increasing need to control the microstructure in thin sputtered Ta films for application...
Here we present our study of the stress dependence in Al thin films on deposition conditions. We con...
Here we present our study of the stress dependence in Al thin films on deposition conditions. We con...
The present study investigates the effect of deposition temperature (ambient and liquid N2 temperatu...
The magnetron sputter deposition of metallic thin films usually requires high vacuum sputtering cond...
The influence of the composition on the crystallographic properties of deposited Mg(M)O (with M=Al, ...
The present study investigates the effect of deposition temperature (ambient and liquid N-2 temperat...
Abstract : The purpose of this research was to prepare, investigate and understand the characteristi...
The energy available for an adatom diffusing on the substrate surface is an important parameter with...
DC reactive magnetron sputtering was applied to deposit mixed oxide thin films. To modify the stoich...
International audiencen this work, AlNxOy thin films were deposited by reactive magnetron sputtering...
ABSTRACT The coating process using magnetron sputtering technique is widely used to create metal and...
temperature could be independently controlled due to the low deposition rate of the aluminium. The d...