DE 102006042764 B3 UPAB: 20080604 NOVELTY - The wafer (1) has multiple gas absorption arrays (2) that are covered with a uniform surface (3) on a getter material and arranged in such a manner that the gas absorption arrays come to lie in a cavity that is to be formed. A getter test array (4) is arranged in such a manner that the getter test array comes to lie in the cavity, where the getter test array exhibits a small getter material surface (5) than the gas absorption array surface. Another getter test array (6) is provided, where the getter test array (6) is free of getter material. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a method for checking a getter gas absorption capacity of a multiplicate component. USE - Bas...
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WO 2007113325 A1 UPAB: 20071121 NOVELTY - The multiple-component has a flat substrate and a flat cap...
WO2005105308 A UPAB: 20051213 NOVELTY - The structured porous carrier (1), for micro-arrays, is desi...
WO2003076921 A UPAB: 20040318 NOVELTY - Integrated gas sensor comprises a gas-sensitive resistance l...
WO 2008087022 A1 UPAB: 20080806 NOVELTY - The housing has a carrier wafer (1) with a micro-mechanica...
DE 10254427 A UPAB: 20040716 NOVELTY - Device for coating a substrate comprises an isolator (3) arra...
DE 10339997 A UPAB: 20050504 NOVELTY - The carrier for a wafer (110) has a substrate (110) on one si...
NOVELTY - The device includes a radiation source for emitting radiation in an absorption wavelength ...
NOVELTY - The silicon wafer surface testing chamber comprises a wafer-holding housing having side wa...
Different gas sensors have been investigated for the detection of emissions with a new calibration g...
DE 102009023472 A1 UPAB: 20101216 NOVELTY - The coating plant comprises an evacuatable recipient (10...
DE 102009014891 A1 UPAB: 20101011 NOVELTY - The apparatus (100) for evaporating a material (104) ins...
WO 2007054524 A1 UPAB: 20070903 NOVELTY - The wafer has an inner side with circular outer regions, c...
WO2003095698 A UPAB: 20040102 NOVELTY - A device for electron beam attenuation of reactively formed ...
WO2005036140 A UPAB: 20050603 NOVELTY - Production of a component, for absorbing and/or emitting rad...
A sensor configuration for the measurement of gas components utilizes an FET (1) with a semiconducti...
WO 2007113325 A1 UPAB: 20071121 NOVELTY - The multiple-component has a flat substrate and a flat cap...
WO2005105308 A UPAB: 20051213 NOVELTY - The structured porous carrier (1), for micro-arrays, is desi...
WO2003076921 A UPAB: 20040318 NOVELTY - Integrated gas sensor comprises a gas-sensitive resistance l...
WO 2008087022 A1 UPAB: 20080806 NOVELTY - The housing has a carrier wafer (1) with a micro-mechanica...
DE 10254427 A UPAB: 20040716 NOVELTY - Device for coating a substrate comprises an isolator (3) arra...
DE 10339997 A UPAB: 20050504 NOVELTY - The carrier for a wafer (110) has a substrate (110) on one si...
NOVELTY - The device includes a radiation source for emitting radiation in an absorption wavelength ...
NOVELTY - The silicon wafer surface testing chamber comprises a wafer-holding housing having side wa...
Different gas sensors have been investigated for the detection of emissions with a new calibration g...
DE 102009023472 A1 UPAB: 20101216 NOVELTY - The coating plant comprises an evacuatable recipient (10...
DE 102009014891 A1 UPAB: 20101011 NOVELTY - The apparatus (100) for evaporating a material (104) ins...
WO 2007054524 A1 UPAB: 20070903 NOVELTY - The wafer has an inner side with circular outer regions, c...
WO2003095698 A UPAB: 20040102 NOVELTY - A device for electron beam attenuation of reactively formed ...
WO2005036140 A UPAB: 20050603 NOVELTY - Production of a component, for absorbing and/or emitting rad...
A sensor configuration for the measurement of gas components utilizes an FET (1) with a semiconducti...