LaF3 thin films of different thicknesses were deposited on CaF2 (111) and silicon substrates by boat evaporation at a relatively low substrate temperature of 150°C. Optical and mechanical properties have been investigated and are discussed
<div>In this article LaF3 films in LaF3/Si structure have been investigated for the measurement of f...
The structure evolution characteristics of MgF2 and NdF3 optical thin films on CaF2 (111) substrates...
By coupling a homemade substrate holder with a refrigerated ethanol cryogenic system, we succeeded i...
LaF3 thin films of different thicknesses were deposited on CaF2 (111) and silicon substrates at a re...
LaF3 thin films were prepared by thermal boat evaporation at different substrate temperatures and va...
This study characterizes thin films of eleven lanthanide trifluorides which are potentially useful f...
As a result of health and safety issues surrounding the use of radioactive materials on coated optic...
Since excimer laser applications extend to deep and vacuum UV wavelengths at 248 nm, 193 nm and 157 ...
LaF3 films in the 5−40 nm thickness range were grown on Si(111) by molecular beam epitaxy. The subs...
ArF lithography technology requires minimization of optical losses due to scattering and absorption....
The present candidates for low loss dielectric optical coatings at VUV excimer laser wavelengths are...
Single layers of MgF2 and LaF3 were deposited upon superpolished fused-silica and CaF2 substrates by...
In the thickness range 50-500 nm at substrate temperatures of 300, 375 and 575 K the structures of p...
LaTiO3 films were prepared under various deposition temperatures using electron beam evaporation on ...
Impurity contents of loosely packed CaF2 and LaF3 films are analysed by SNMS depth-profiling. On the...
<div>In this article LaF3 films in LaF3/Si structure have been investigated for the measurement of f...
The structure evolution characteristics of MgF2 and NdF3 optical thin films on CaF2 (111) substrates...
By coupling a homemade substrate holder with a refrigerated ethanol cryogenic system, we succeeded i...
LaF3 thin films of different thicknesses were deposited on CaF2 (111) and silicon substrates at a re...
LaF3 thin films were prepared by thermal boat evaporation at different substrate temperatures and va...
This study characterizes thin films of eleven lanthanide trifluorides which are potentially useful f...
As a result of health and safety issues surrounding the use of radioactive materials on coated optic...
Since excimer laser applications extend to deep and vacuum UV wavelengths at 248 nm, 193 nm and 157 ...
LaF3 films in the 5−40 nm thickness range were grown on Si(111) by molecular beam epitaxy. The subs...
ArF lithography technology requires minimization of optical losses due to scattering and absorption....
The present candidates for low loss dielectric optical coatings at VUV excimer laser wavelengths are...
Single layers of MgF2 and LaF3 were deposited upon superpolished fused-silica and CaF2 substrates by...
In the thickness range 50-500 nm at substrate temperatures of 300, 375 and 575 K the structures of p...
LaTiO3 films were prepared under various deposition temperatures using electron beam evaporation on ...
Impurity contents of loosely packed CaF2 and LaF3 films are analysed by SNMS depth-profiling. On the...
<div>In this article LaF3 films in LaF3/Si structure have been investigated for the measurement of f...
The structure evolution characteristics of MgF2 and NdF3 optical thin films on CaF2 (111) substrates...
By coupling a homemade substrate holder with a refrigerated ethanol cryogenic system, we succeeded i...
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