DE 102006002333 A1 UPAB: 20071018 NOVELTY - Extinguishing arc discharges during plasma working processes comprises detecting a pulse (3), determining the time between discharges, and then changing the pulse pattern. The pattern is changed using a control unit so the duration of the pause after the pulse is longer than the duration of the pause before the pulse. USE - The process is used to extinguish arc discharges during plasma working processes. ADVANTAGE - The process can be used for unipolar and bipolar processes
For combining high performance and security during Electro-discharge machining (ED-ma-chining) the p...
The pseudospark discharge is a low pressure gas discharge which can be divided into several, transie...
To reduce the reactivity of a glow pulse discharge, the device for stepwise matching of the communic...
Known processes and devices monitor the arc discharge by checking the electrical parameters. In the ...
The gas discharge excitation method uses an applied AC voltage with a frequency of between 500Hz and...
A procedure for controlling glow discharge processes has pulse-shaped energy in-feed into at least t...
DE 19848636 A UPAB: 20000712 NOVELTY - The discharge current and/or voltage of each of two half-wave...
DE 10034895 A UPAB: 20020621 NOVELTY - Recognizing flashovers in pulsed plasmas in a vacuum comprise...
DE1004010261 A UPAB: 20051027 NOVELTY - The plasma generator system has a hollow cathode (1) that is...
A new type of arc evaporator will be described which was developed to improve the deposition rate fo...
A new type of arc evaporator will be described which was developed to improve the deposition rate fo...
In order to perform bipolar low-pressure glow processes, a static and dynamic matching of the genera...
WO 2010069594 A1 UPAB: 20100714 NOVELTY - The process comprises activating the vapor from a coating ...
DE 3901401 A UPAB: 19971006 The method applies the voltage between anode and cathode in pulses. At m...
DE 19902146 A UPAB: 20001018 NOVELTY - A direct current is applied between the hollow cathode (1) an...
For combining high performance and security during Electro-discharge machining (ED-ma-chining) the p...
The pseudospark discharge is a low pressure gas discharge which can be divided into several, transie...
To reduce the reactivity of a glow pulse discharge, the device for stepwise matching of the communic...
Known processes and devices monitor the arc discharge by checking the electrical parameters. In the ...
The gas discharge excitation method uses an applied AC voltage with a frequency of between 500Hz and...
A procedure for controlling glow discharge processes has pulse-shaped energy in-feed into at least t...
DE 19848636 A UPAB: 20000712 NOVELTY - The discharge current and/or voltage of each of two half-wave...
DE 10034895 A UPAB: 20020621 NOVELTY - Recognizing flashovers in pulsed plasmas in a vacuum comprise...
DE1004010261 A UPAB: 20051027 NOVELTY - The plasma generator system has a hollow cathode (1) that is...
A new type of arc evaporator will be described which was developed to improve the deposition rate fo...
A new type of arc evaporator will be described which was developed to improve the deposition rate fo...
In order to perform bipolar low-pressure glow processes, a static and dynamic matching of the genera...
WO 2010069594 A1 UPAB: 20100714 NOVELTY - The process comprises activating the vapor from a coating ...
DE 3901401 A UPAB: 19971006 The method applies the voltage between anode and cathode in pulses. At m...
DE 19902146 A UPAB: 20001018 NOVELTY - A direct current is applied between the hollow cathode (1) an...
For combining high performance and security during Electro-discharge machining (ED-ma-chining) the p...
The pseudospark discharge is a low pressure gas discharge which can be divided into several, transie...
To reduce the reactivity of a glow pulse discharge, the device for stepwise matching of the communic...