Process optimization by means of integrated monitoring tools in the semiconductor industry

Semiconductor manufacturing still follows Moorés Law, stating a cost reduction of approximately 25 to 30 % per year, a value actu-ally achieved in the past 40 years. One of the key enablers for fur-ther continuation of Moore's Law will be a much tighter process control. This paper describes aspects of Advanced Process Control and especially of integrated metrology, the foundation of process optimization by means of integrated process monitoring tools. Shortest response time requires that measurement methods have to be engineered as near as possible to the process itself, thus reduc-ing the time between processes, measurement and corrective ac-tions. Such integrated metrology is realized as in-line metrology, in situ metrology or virtual metrology. This paper presents the devel-opment of sensors, their integration and results for control of resist processing in lithography, use of according sensors for the control and endpoint detection in CMP processes, and novel methods for geometrical metrology in CMP process monitoring