Vorrichtung zum Durchführen von Elektronenstrahlprozessen

DE 102007021893 A1 UPAB: 20081126 NOVELTY - An electron beam emitter for thermal and non-thermal processes has a substrate with an axial electron beam (6) emitter (1) directed through a first vacuum chamber (2) in which thermal processes may be executed. The chamber (2) has a substrate holder and moving device (8). The first chamber has a beam exit window (4) to a second chamber (3) with a second substrate holder (9). USE - Electron beam emitter and process chamber for e.g. electron beam welding, edge hardening for metals, cross-linking plastic materials, paint hardening, research and development applications, education. ADVANTAGE - The electron beam assembly is suitable for both thermal and non-thermal processes