Anordnung zur Ausbildung von Beschichtungen auf Substraten im Vakuum

DE 102007019982 A1 UPAB: 20090103 NOVELTY - In a process to apply a coating to a substrate in a vacuum, a plasma arc is directed at a cathode target. The arc discharges between the cathode and target via a focused laser beam through an aperture, and ignites on the target surface. A permanent magnet or electromagnet is positioned to the side, above or below the laser beam between the window and the target. The magnet guides the laser beam to the target. USE - Process to apply a coating to a substrate in a vacuum. ADVANTAGE - The magnet minimises plasma vagabond discharge around the window