At Fraunhofer IPMS Dresden micromechanical mirror arrays are developed and fabricated using a high-voltage CMOS process for applications such as lithographic mask writers and adaptive optics. Different approaches for the fabrication of micromechanical mirror arrays with up to 1 million analogue addressable pixels in a MEMS-on-CMOS technology are discussed: sacrificial layer technologies of 1-level actuators made from a single Al-TiAl-Al structural multilayer or 2-level actuators with an additional TiAl hinge layer respectively. Also the fabrication of single crystalline Si micro-mirrors using layer-transfer bonding is discussed
Multi-object spectroscopy (MOS) is a powerful tool for space and ground-based telescopes for the stu...
Design, microfabrication, and integration of a micromachined spatial light modulator (μSLM) device a...
The Fraunhofer IPMS and Micronic Laser Systems AB have developed a technology for microlithography u...
In this study we used the commercial 0.35 µm CMOS (complementary metal oxide semiconductor) process ...
[[abstract]]In this study we used the commercial 0.35 µm CMOS (complementary metal oxide semiconduct...
This paper describes the design and characterization of several types of micromirror devices to incl...
Piezoelectric micromirror array is developed based on microelectromechanical systems (MEMS) technolo...
Spatial light modulators (SLMs) based on micro-mirrors for use in DUV lithography and adaptive optic...
This paper presents a novel CMOS-compatible fabrication process and evaluations of a micro mirror ar...
In this paper, we demonstrate the first high-resolution spatial-light-modulator chip with 1 million ...
The devices consist of an array of independently addressable CMOS DRAM cells each controlling a micr...
In this paper, we report on the heterogeneous integration of monocrystalline silicon membranes for t...
Based on silicon micromachining technology, a novel deformable mirror with 30 mm ?? 30 mm effective ...
Micro Scanning Mirrors for light deflection and large scale integrated Micro Mirror Arrays for light...
The Fraunhofer IPMS, in cooperation with Micronic Laser Systems, develops and fabricates micromirror...
Multi-object spectroscopy (MOS) is a powerful tool for space and ground-based telescopes for the stu...
Design, microfabrication, and integration of a micromachined spatial light modulator (μSLM) device a...
The Fraunhofer IPMS and Micronic Laser Systems AB have developed a technology for microlithography u...
In this study we used the commercial 0.35 µm CMOS (complementary metal oxide semiconductor) process ...
[[abstract]]In this study we used the commercial 0.35 µm CMOS (complementary metal oxide semiconduct...
This paper describes the design and characterization of several types of micromirror devices to incl...
Piezoelectric micromirror array is developed based on microelectromechanical systems (MEMS) technolo...
Spatial light modulators (SLMs) based on micro-mirrors for use in DUV lithography and adaptive optic...
This paper presents a novel CMOS-compatible fabrication process and evaluations of a micro mirror ar...
In this paper, we demonstrate the first high-resolution spatial-light-modulator chip with 1 million ...
The devices consist of an array of independently addressable CMOS DRAM cells each controlling a micr...
In this paper, we report on the heterogeneous integration of monocrystalline silicon membranes for t...
Based on silicon micromachining technology, a novel deformable mirror with 30 mm ?? 30 mm effective ...
Micro Scanning Mirrors for light deflection and large scale integrated Micro Mirror Arrays for light...
The Fraunhofer IPMS, in cooperation with Micronic Laser Systems, develops and fabricates micromirror...
Multi-object spectroscopy (MOS) is a powerful tool for space and ground-based telescopes for the stu...
Design, microfabrication, and integration of a micromachined spatial light modulator (μSLM) device a...
The Fraunhofer IPMS and Micronic Laser Systems AB have developed a technology for microlithography u...