EP 2287884 A2 UPAB: 20110307 NOVELTY - The gas flow sputter source has a hollow cathode (2) with an inlet opening and an outlet opening for inert gas. A housing (7) is attached in the area of the outlet opening at the hollow cathode. The housing has a recess, whose width amounts to 80 percent of the width of the outlet opening. The side of the housing facing the hollow cathode has a curved surface. The housing is made of steel alloys or aluminum. USE - Gas flow sputter source. ADVANTAGE - The gas flow sputter source has a hollow cathode with an inlet opening and an outlet opening for inert gas, where a housing is attached in the area of the outlet opening at the hollow cathode, and hence ensures long-term operation of the gas flow sputter s...
DE1004012847 A UPAB: 20051109 NOVELTY - Device for optionally reactive plasma etching of flat object...
DE 19841012 C UPAB: 20000313 NOVELTY - One or more hollow cathodes (7), one or more ring anodes (10)...
Sputtering changes the analytical performance of the hollow cathode as an emission source. Proper co...
The invention relates to a device for high-velocity gas flow sputtering, said device consisting of a...
In a process for coating substrates by gas flow sputtering using a hollow cathode glow discharge in ...
Sputter source comprising a linear hollow cathode, an anode, a suitable power supply, an inflow devi...
DE 10101850 C UPAB: 20020618 NOVELTY - The gas generator production process involves sticking the pa...
NOVELTY - A substrate is coated with at least partially crystalline aluminum oxide by hollow cathode...
WO 2009077980 A1 UPAB: 20090720 NOVELTY - The source has a cathode body (110) and an anode body (120...
DE 102007061418 A1 UPAB: 20090728 NOVELTY - The method comprises reducing gas flow through a hollow ...
The source has a hollow cathode (1) comprising an active surface (2) and a passive surface (3) that ...
WO2003087426 A UPAB: 20031120 NOVELTY - A coating device has a cathode chamber (3) and a substrate c...
DE 19958643 C UPAB: 20010522 NOVELTY - Apparatus for coating an object (3) comprises a vacuum chambe...
The apparatus includes a vacuum chamber (1), at least one sputter source (2) with at least one targe...
DE 10129313 C UPAB: 20021209 NOVELTY - Sputtering process comprises: activating the substrate surfac...
DE1004012847 A UPAB: 20051109 NOVELTY - Device for optionally reactive plasma etching of flat object...
DE 19841012 C UPAB: 20000313 NOVELTY - One or more hollow cathodes (7), one or more ring anodes (10)...
Sputtering changes the analytical performance of the hollow cathode as an emission source. Proper co...
The invention relates to a device for high-velocity gas flow sputtering, said device consisting of a...
In a process for coating substrates by gas flow sputtering using a hollow cathode glow discharge in ...
Sputter source comprising a linear hollow cathode, an anode, a suitable power supply, an inflow devi...
DE 10101850 C UPAB: 20020618 NOVELTY - The gas generator production process involves sticking the pa...
NOVELTY - A substrate is coated with at least partially crystalline aluminum oxide by hollow cathode...
WO 2009077980 A1 UPAB: 20090720 NOVELTY - The source has a cathode body (110) and an anode body (120...
DE 102007061418 A1 UPAB: 20090728 NOVELTY - The method comprises reducing gas flow through a hollow ...
The source has a hollow cathode (1) comprising an active surface (2) and a passive surface (3) that ...
WO2003087426 A UPAB: 20031120 NOVELTY - A coating device has a cathode chamber (3) and a substrate c...
DE 19958643 C UPAB: 20010522 NOVELTY - Apparatus for coating an object (3) comprises a vacuum chambe...
The apparatus includes a vacuum chamber (1), at least one sputter source (2) with at least one targe...
DE 10129313 C UPAB: 20021209 NOVELTY - Sputtering process comprises: activating the substrate surfac...
DE1004012847 A UPAB: 20051109 NOVELTY - Device for optionally reactive plasma etching of flat object...
DE 19841012 C UPAB: 20000313 NOVELTY - One or more hollow cathodes (7), one or more ring anodes (10)...
Sputtering changes the analytical performance of the hollow cathode as an emission source. Proper co...