Planar concave grating demultiplexer with high reflective bragg reflector facets

We present measurement results of an ultracompact four-channel silicon-on-insulator planar concave grating demultiplexer fabricated in a complimentary metal-oxide-semiconductor line using deep-ultraviolet lithography. The demultiplexer has four output channels separated by 20 nm and a footprint of only 280 mu m x 150 mu m. The crosstalk is better than -25 dB and the on-chip loss is drastically reduced down to 1.9 dB by replacing each facet by a second-order Bragg reflector.We present measurement results of an ultracompact four-channel silicon-on-insulator planar concave grating demultiplexer fabricated in a complimentary metal-oxide-semiconductor line using deep-ultraviolet lithography. The demultiplexer has four output channels separated by 20 nm and a footprint of only 280 mu m x 150 mu m. The crosstalk is better than -25 dB and the on-chip loss is drastically reduced down to 1.9 dB by replacing each facet by a second-order Bragg reflector.A