Three different methods of stress measurement with strong spatial resolution are presented. They base on stress relief techniques caused by focused ion beam milling, on altered electron backscattering by deformed lattices and on Stokes line shift measurements by Raman spectroscopy. The capability of these methods is demonstrated by their application to typical MEMS structures. A comparison between the methods is performed in order to outline potentials and limitations
Three different experimental methods have been used to determine mechanical stresses in silicon near...
The paper reviews some of the currently used strain / stress measurement tools developed for rather ...
Intrinsic stresses in semiconductor and MEMS devices significantly affect functional behaviour and r...
Three different methods of stress measurement with strong spatial resolution are presented. They bas...
Residual stresses in semiconductor and MEMS devices superposing functional and environmental loading...
Residual stresses im MEMS devices are one of the crucial reliability issues, because they are inhere...
A new approach to the local measurement of residual stress in microstructures is described in this p...
A new approach to the local measurement of residual stress in microstructures is described in this p...
In this paper, a new approach is presented for local residual stress measurement in MEMS structures....
Research results obtained for local stress determination on micro and nanotechnology components are ...
The use of a focused ion beam equipment is reported to find out the in-plane residual stress value o...
Integration of micro and nano devices causes several new reliability issues to be analyzed and solve...
Quantification of residual stress gradients can provide great improvements in understanding the comp...
The paper comprises research results obtained for stress determination on micro and nanotechnology c...
In this paper, the authors present a new approach to residual stress measurement that takes advantag...
Three different experimental methods have been used to determine mechanical stresses in silicon near...
The paper reviews some of the currently used strain / stress measurement tools developed for rather ...
Intrinsic stresses in semiconductor and MEMS devices significantly affect functional behaviour and r...
Three different methods of stress measurement with strong spatial resolution are presented. They bas...
Residual stresses in semiconductor and MEMS devices superposing functional and environmental loading...
Residual stresses im MEMS devices are one of the crucial reliability issues, because they are inhere...
A new approach to the local measurement of residual stress in microstructures is described in this p...
A new approach to the local measurement of residual stress in microstructures is described in this p...
In this paper, a new approach is presented for local residual stress measurement in MEMS structures....
Research results obtained for local stress determination on micro and nanotechnology components are ...
The use of a focused ion beam equipment is reported to find out the in-plane residual stress value o...
Integration of micro and nano devices causes several new reliability issues to be analyzed and solve...
Quantification of residual stress gradients can provide great improvements in understanding the comp...
The paper comprises research results obtained for stress determination on micro and nanotechnology c...
In this paper, the authors present a new approach to residual stress measurement that takes advantag...
Three different experimental methods have been used to determine mechanical stresses in silicon near...
The paper reviews some of the currently used strain / stress measurement tools developed for rather ...
Intrinsic stresses in semiconductor and MEMS devices significantly affect functional behaviour and r...