The development of high brightness lasers was pushed enormously in the last five years. Two different trends can be noticed. Beside the continuous growing laser power in the multi mode sector up to 100 kW, diffraction limited laser systems are available in the range up to 10 kW [1]. High power diffraction limited lasers deliver a new quantity of laser power induced aberrations [2]. Currently no online measurement equipment for optical aberrations is available. This paper describes an alternative online method to capture the optical aberrations of lenses. The developed tool allows a comparing benchmark of different optical components
International audienceA rasterscan procedure adapted to the sub-picosecond regime is set to determin...
Adaptive optics is used to abate aberrations with a wavefront correction. It is widely used in astro...
Aberration metrology and monitoring of lithography projection systems in the semiconductor industry ...
AbstractThe development of high brightness lasers was pushed enormously in the last five years. Two ...
The increased brilliance of solid state lasers during the last years creates a new challenge in guid...
Further advancement of high-energy pulsed lasers requires a parallel development of appropriate opti...
New objective methods to measure the optical aberrations of the eye are reviewed, in particular the ...
We show how FWHM, FWI/e 2, Strehl ratio, and encircled energy figures of merit vary with different t...
We give the proof of principle of a new experimental method to determine the aberrations of an optic...
We present a full-scale numerical study of thermally induced optical aberrations on the primary mirr...
In optical lithography the degradation of image quality due to aberrations present in the exposure t...
A numerical analysis of laser resonators with aberrations is presented. {T}he analysis shows that ab...
A significant factor in the degradation of nanolithographic image fidelity is optical wavefront aber...
In optical lithography the degradation of imagequality due to aberrations present in the exposure to...
Research on Focusing Large Diameter Beams High intensity laser research is a topic of great interest...
International audienceA rasterscan procedure adapted to the sub-picosecond regime is set to determin...
Adaptive optics is used to abate aberrations with a wavefront correction. It is widely used in astro...
Aberration metrology and monitoring of lithography projection systems in the semiconductor industry ...
AbstractThe development of high brightness lasers was pushed enormously in the last five years. Two ...
The increased brilliance of solid state lasers during the last years creates a new challenge in guid...
Further advancement of high-energy pulsed lasers requires a parallel development of appropriate opti...
New objective methods to measure the optical aberrations of the eye are reviewed, in particular the ...
We show how FWHM, FWI/e 2, Strehl ratio, and encircled energy figures of merit vary with different t...
We give the proof of principle of a new experimental method to determine the aberrations of an optic...
We present a full-scale numerical study of thermally induced optical aberrations on the primary mirr...
In optical lithography the degradation of image quality due to aberrations present in the exposure t...
A numerical analysis of laser resonators with aberrations is presented. {T}he analysis shows that ab...
A significant factor in the degradation of nanolithographic image fidelity is optical wavefront aber...
In optical lithography the degradation of imagequality due to aberrations present in the exposure to...
Research on Focusing Large Diameter Beams High intensity laser research is a topic of great interest...
International audienceA rasterscan procedure adapted to the sub-picosecond regime is set to determin...
Adaptive optics is used to abate aberrations with a wavefront correction. It is widely used in astro...
Aberration metrology and monitoring of lithography projection systems in the semiconductor industry ...