A new magnetically enhanced hollow-cathode based plasma source was developed in order to generate a large volume homogeneous plasma for substrate pretreatment and plasmaactivated deposition processes. The hollow cathode plasma is characterized by various diagnostic techniques. Spatially resolved Langmuir probe and optical emission spectroscopy measurements reveal plasma densities of more than 1012 cm-3 and 1011 cm-3 at distances of 30 cm and 125 cm from the plasma source, respectively, and electron temperatures between 6 eV and 1 eV in pure argon atmosphere at pressures between 0.1 and 3.4 Pa. When operated in nitrogen, energy-dispersive mass spectrometry demonstrates that efficient ionization and dissociation of the molecules takes place. ...
Hollow cathodes are sources of electrons used for gas ionization and beam neutralization in Hall eff...
Hollow cathode discharge studies have shown the existence of energetic ions at high discharge curren...
A new type of plasma sputtering device, named the hollow cathode magnetron (HCM), has been developed...
An efficient plasma source has been established by arranging a hot hollow cathode electron emitter i...
Hollow cathode arc discharges are efficient plasma sources and are applied in substrate pretreatment...
The hollow cathode will be presented as a plasma source for reactive evaporation processes. The holl...
This paper deals with the characterization of an ionized physical vapor deposition (IPVD) by means o...
This thesis presents experimental and modelling research on atmospheric pressure hollow cathodes and...
An array of novel hollow cathode plasma sources of 4 mm diameter and driven by up to 500 W of 13.56 ...
Development of coating deposition technologies, in terms of performance and costs, is an ongoing pro...
NRL has developed a number of hollow cathodes to generate sheets of electrons culminating in a ‘Larg...
Abstract: Measurements are presented of plasma properties near a hollow cathode made using a rapidl...
Thin films of metals and compounds have a very wide range of applications today. Many of the deposit...
The hollow cathode is an effective source of dense, low energy plasma. Hollow cathodes find use in ...
Amorphous carbon films deposited by plasma-based processes are of increasing importance for tribolog...
Hollow cathodes are sources of electrons used for gas ionization and beam neutralization in Hall eff...
Hollow cathode discharge studies have shown the existence of energetic ions at high discharge curren...
A new type of plasma sputtering device, named the hollow cathode magnetron (HCM), has been developed...
An efficient plasma source has been established by arranging a hot hollow cathode electron emitter i...
Hollow cathode arc discharges are efficient plasma sources and are applied in substrate pretreatment...
The hollow cathode will be presented as a plasma source for reactive evaporation processes. The holl...
This paper deals with the characterization of an ionized physical vapor deposition (IPVD) by means o...
This thesis presents experimental and modelling research on atmospheric pressure hollow cathodes and...
An array of novel hollow cathode plasma sources of 4 mm diameter and driven by up to 500 W of 13.56 ...
Development of coating deposition technologies, in terms of performance and costs, is an ongoing pro...
NRL has developed a number of hollow cathodes to generate sheets of electrons culminating in a ‘Larg...
Abstract: Measurements are presented of plasma properties near a hollow cathode made using a rapidl...
Thin films of metals and compounds have a very wide range of applications today. Many of the deposit...
The hollow cathode is an effective source of dense, low energy plasma. Hollow cathodes find use in ...
Amorphous carbon films deposited by plasma-based processes are of increasing importance for tribolog...
Hollow cathodes are sources of electrons used for gas ionization and beam neutralization in Hall eff...
Hollow cathode discharge studies have shown the existence of energetic ions at high discharge curren...
A new type of plasma sputtering device, named the hollow cathode magnetron (HCM), has been developed...