The design and performance of an improved microwave plasma assisted chemical vapor deposition (MPACVD) reactor is described. This reactor operates with high power densities and at pressures up to 300 torr. Differences from earlier MPACVD reactor designs [4] include an increase in applicator and dome size and the excitation of the applicator with a new "hybrid "TM 0/TEM 001" mode. The reactor is experimentally evaluated by synthesizing single crystal diamond (SCD) at pressures from 180 to 300 torr with absorbed power densities between 400 and 1000 W/cm 3. Without N 2 addition SCD growth rates as high as 75 m/h were observed. A SCD growth window between 950°C and 1300°C was identified and within this growth window growth rates were 1.2 to 2.5...
In this paper, we report on the development of process methods and apparatus that enable the deposit...
Diamond has many attractive properties such as high hardness, good durability and excellence heat co...
The low power reactor for microwave chemical vapor deposition process is described. The rotating Mo ...
The detailed experimental behavior of a microwave plasma assisted chemical vapor deposition (MPACVD)...
Microwave plasma assisted synthesis of diamond is experimentally investigated using high purity, 2-5...
High pressure microwave discharges (150 Torr to one atmosphere) have been the focus of numerous rece...
Optical grade diamond, in particular, high-end products, are mainly used for aerospace and defense p...
A multiple substrate, microwave plasma-assisted chemical vapor deposition synthesis process for sing...
Diamond is a wide band gap semiconductor of 5.5eV, and it has high carrier mobility, mechanical hard...
e/hydrogen were used for UNCD deposition and hydrogen/methane was highest quality diamond, high rate...
A polycrystalline diamond grown by the chemical vapor deposition (CVD) technique is recognized as a ...
A computer program has been developed for the design and optimization of microwave plasma reactors u...
Chemical vapor deposition techniques prove to be extremely valuable for the deposition of a variety ...
The epitaxial lateral growth of single-crystal diamond (SCD) using a plate-to-plate microwave plasma...
Diamond containing engineered color centers is rapidly becoming a medium of choice for quantum infor...
In this paper, we report on the development of process methods and apparatus that enable the deposit...
Diamond has many attractive properties such as high hardness, good durability and excellence heat co...
The low power reactor for microwave chemical vapor deposition process is described. The rotating Mo ...
The detailed experimental behavior of a microwave plasma assisted chemical vapor deposition (MPACVD)...
Microwave plasma assisted synthesis of diamond is experimentally investigated using high purity, 2-5...
High pressure microwave discharges (150 Torr to one atmosphere) have been the focus of numerous rece...
Optical grade diamond, in particular, high-end products, are mainly used for aerospace and defense p...
A multiple substrate, microwave plasma-assisted chemical vapor deposition synthesis process for sing...
Diamond is a wide band gap semiconductor of 5.5eV, and it has high carrier mobility, mechanical hard...
e/hydrogen were used for UNCD deposition and hydrogen/methane was highest quality diamond, high rate...
A polycrystalline diamond grown by the chemical vapor deposition (CVD) technique is recognized as a ...
A computer program has been developed for the design and optimization of microwave plasma reactors u...
Chemical vapor deposition techniques prove to be extremely valuable for the deposition of a variety ...
The epitaxial lateral growth of single-crystal diamond (SCD) using a plate-to-plate microwave plasma...
Diamond containing engineered color centers is rapidly becoming a medium of choice for quantum infor...
In this paper, we report on the development of process methods and apparatus that enable the deposit...
Diamond has many attractive properties such as high hardness, good durability and excellence heat co...
The low power reactor for microwave chemical vapor deposition process is described. The rotating Mo ...