Capacitance-voltage (C-I/) and current-voltage measurements have been undertaken on metal-ferroelectric-semiconductor capacitors and ferroelectric field-effect transistors (FeFETs) using the ferroelectric polymer poly(vinylidenefluoride-trifluoroethylene) as the gate insulator and poly(3-hexylthiophene) as the active semiconductor. C-V measurements, voltage-dependence of gate currents and FeFET transfer characteristics all confirm that ferroelectric polarization is stable and only reverses when positive/negative coercive fields are exceeded for the first time. The apparent instability observed following the application of depletion voltages arises from the development of a negative interfacial charge which more than compensates the ferroele...
Recently, a number of papers have demonstrated sub-60 mV/decade switching by using the negative capa...
Ferroelectric field effect transistors (FE-FETs) consisting of tunable dielectric layers are utilize...
We demonstrate a rewritable, non-volatile memory device with flexible plastic active layers deposite...
Large positive shifts of turn-on voltage Vto were observed in ferroelectric organic thin film transi...
Dielectric measurements have been carried out on all-organic metal-insulator-semiconductor structure...
The authors present measurements that elucidate the mechanism behind the observed drain current bist...
We study the local ferroelectric polarization and depolarization of poly(vinylidene fluoride-cotrifl...
Staggered bottom-contact top-gate organic ferroelectric field-effect transistors are fabricated with...
In this work, we investigate the ferroelectric polarization state in metal-ferroelectric-semiconduct...
Measurements of the capacitance of metal-insulator-semiconductor capacitors and the output character...
The dense surface charges expressed by a ferroelectric polymeric thin film induce ion displacement w...
Because of the thermal distribution of electrons in a semiconductor, modern transistors cannot be tu...
We report electrical characterization of memory elements consisting of a p-type silicon field-effect...
Recently, a number of papers have demonstrated sub-60 mV/decade switching by using the negative capa...
Ferroelectric field effect transistors (FE-FETs) consisting of tunable dielectric layers are utilize...
We demonstrate a rewritable, non-volatile memory device with flexible plastic active layers deposite...
Large positive shifts of turn-on voltage Vto were observed in ferroelectric organic thin film transi...
Dielectric measurements have been carried out on all-organic metal-insulator-semiconductor structure...
The authors present measurements that elucidate the mechanism behind the observed drain current bist...
We study the local ferroelectric polarization and depolarization of poly(vinylidene fluoride-cotrifl...
Staggered bottom-contact top-gate organic ferroelectric field-effect transistors are fabricated with...
In this work, we investigate the ferroelectric polarization state in metal-ferroelectric-semiconduct...
Measurements of the capacitance of metal-insulator-semiconductor capacitors and the output character...
The dense surface charges expressed by a ferroelectric polymeric thin film induce ion displacement w...
Because of the thermal distribution of electrons in a semiconductor, modern transistors cannot be tu...
We report electrical characterization of memory elements consisting of a p-type silicon field-effect...
Recently, a number of papers have demonstrated sub-60 mV/decade switching by using the negative capa...
Ferroelectric field effect transistors (FE-FETs) consisting of tunable dielectric layers are utilize...
We demonstrate a rewritable, non-volatile memory device with flexible plastic active layers deposite...