Vorrichtung zum Verdampfen eines Materials mittels eines Elektronenstrahls innerhalb einer Vakuumkammer

The apparatus comprises an electron gun (4) for generating an electron beam (5), which passes over a region of a surface of a material (3) to be evaporated in an evaporation zone, a unit for continuously tracking the material to be evaporated in the evaporation zone, a sensor for detecting an actual value for an intensity of X-ray that is emitted during the impact of the electron beam on the surface of the material to be evaporated, a diaphragm disposed between the material to be evaporated and the sensor, and an evaluation unit. The apparatus comprises an electron gun (4) for generating an electron beam (5), which passes over a region of a surface of a material (3) to be evaporated in an evaporation zone, a unit for continuously tracking the material to be evaporated in the evaporation zone, a sensor for detecting an actual value for an intensity of X-ray that is emitted during the impact of the electron beam on the surface of the material to be evaporated, a diaphragm disposed between the material to be evaporated and the sensor, an evaluation unit for comparing the actual value for the intensity of X-ray radiation with a desired value for the intensity of the X-rays radiation and for generating a signal depending on the result of the comparison, and an actuator with which velocity and/or quantity of the X-ray radiation is variable so that the material to be evaporated is adjusted into the evaporization zone. The diaphragm shields the emitted X-ray radiation in a vertical region, and comprises an aperture by which emitted X-ray radiation impinges on the sensor. A rotatable disc is arranged between the aperture of the diaphragm and the sensor. The sensor is a part of a group of sensors, which are arranged on two vertically superimposed sensors. Two evaporization zones are formed in a vacuum chamber (1) to separate the material and to independently adjust the material. The material to be evaporated is periodically and alternately vaporized by the electron beam in each evaporation zone. Each evaporation zone is associated with the aperture. The sensor or the sensor group is assigned to the evaporization zones. The acquired actual value is more assignable in the evaporation zone by the evaluation unit, where the electron beam remains in the evaporation zone for the acquisition time of the actual value