Tantalum pentoxide films have been prepared by plasma ion assisted electron beam evaporation, utilizing argon or xenon as the working gases. The optical constants of the layers have been investigated by spectrophotometry, while X-ray reflection measurements and energy dispersive X-ray spectroscopy have been performed to get information about the density and noble gas content of the layers. The correlation between the level of plasma ion assistance and the layer properties is discussed. With respect to optical quality, the application of xenon as the working gas results in coatings with higher refractive index than the application of argon. This effect is attributed to a more efficient momentum transfer from high energetic working gas ions o...
Thin films of SiO2, Ti02, Ta205, ZrO, and the mixed oxide H4 (Merek) have been deposited onto nonhea...
Tantalum pentoxide thin films have been deposited at room temperature by (dual) ion beam sputtering ...
A great variety of coating materials can be obtained by methods of physical vapor deposition (PVD). ...
Tantalum pentoxide (Ta2 O5) thin films have been deposited by reactive ion beam sputtering at room t...
Oxide coatings have been prepared by PIAD by means of a Leybold Syrus pro 1100 deposition system. Fo...
Tantalum penta-oxide (Ta2O5) thin films were deposited onto highly polished and clean, fused silica ...
The optical and surface morphological properties of thin films are profoundly influenced by the depo...
Tantalum pentoxide (Ta2O5) thin films have been deposited at room temperature by single and dual ion...
Tantalum oxide (Ta2O5) films were synthesized by plasma-assisted at. layer deposition from pentakis(...
We have investigated optical properties of tantalum pentoxide films obtained by anodization of thin ...
The tantalum oxide thin films are promising materials for various applications: as coatings in optic...
Titanium dioxide, aluminum oxide, and silicon dioxide layers have been prepared by plasma ion assist...
Reactively evaporated thin films of tantalum oxide are prepared on glass substrate, using electron ...
A low temperature inorganic plasma-enhanced chemical vapor deposition (PECVD) process has been devel...
Tantalum oxide (TaOx) films were deposited by KrF excimer laser ablation of Ta2O5 targets in an oxyg...
Thin films of SiO2, Ti02, Ta205, ZrO, and the mixed oxide H4 (Merek) have been deposited onto nonhea...
Tantalum pentoxide thin films have been deposited at room temperature by (dual) ion beam sputtering ...
A great variety of coating materials can be obtained by methods of physical vapor deposition (PVD). ...
Tantalum pentoxide (Ta2 O5) thin films have been deposited by reactive ion beam sputtering at room t...
Oxide coatings have been prepared by PIAD by means of a Leybold Syrus pro 1100 deposition system. Fo...
Tantalum penta-oxide (Ta2O5) thin films were deposited onto highly polished and clean, fused silica ...
The optical and surface morphological properties of thin films are profoundly influenced by the depo...
Tantalum pentoxide (Ta2O5) thin films have been deposited at room temperature by single and dual ion...
Tantalum oxide (Ta2O5) films were synthesized by plasma-assisted at. layer deposition from pentakis(...
We have investigated optical properties of tantalum pentoxide films obtained by anodization of thin ...
The tantalum oxide thin films are promising materials for various applications: as coatings in optic...
Titanium dioxide, aluminum oxide, and silicon dioxide layers have been prepared by plasma ion assist...
Reactively evaporated thin films of tantalum oxide are prepared on glass substrate, using electron ...
A low temperature inorganic plasma-enhanced chemical vapor deposition (PECVD) process has been devel...
Tantalum oxide (TaOx) films were deposited by KrF excimer laser ablation of Ta2O5 targets in an oxyg...
Thin films of SiO2, Ti02, Ta205, ZrO, and the mixed oxide H4 (Merek) have been deposited onto nonhea...
Tantalum pentoxide thin films have been deposited at room temperature by (dual) ion beam sputtering ...
A great variety of coating materials can be obtained by methods of physical vapor deposition (PVD). ...