In this paper, the authors report on La/B4C multilayer mirrors designed for an incidence angle of 45° with both maximum reflectivity at a wavelength of 6.7 nm and reflectivity suppression at a wavelength of 20.1 nm. These mirrors were deposited for the EIS-TIMER at the FERMI@Elettra Free Electron Laser. The multilayer structure and optical properties were characterized using grazing incidence X-ray reflectometry with Cu-Kα radiation and EUV reflectometry in the spectral region of 6.5 - 21.0 nm. An anti-reflective coating designed at the wavelength of 20.1 nm had to be deposited on top of the high reflective La/B4C multilayer mirror optimized at a wavelength of 6.7 nm. Measured reflectivities of 53.4% at the wavelength of 6.72 nm and 0.15% a...
Extreme Ultraviolet (EUV) multilayer (ML) technology has been intensively applied in many scientific...
Lithography based on the wavelength of 6.x nm is considered to be a potential extension of the curre...
International audienceRecent extreme ultraviolet sources using high-harmonic generation in a rare ga...
In this paper, the authors report on La/B(4)C multilayer mirrors designed for an incidence angle of ...
In this work we present the design of a Pd/B4C multilayer structure optimized for high reflectance a...
Results on optimization and manufacturing of La B4C multilayers are reported. Such mirrors are prom...
In the first part of this article we experimentally show that contrast between the very thin layers ...
We have developed a multilayer mirror for extreme ultraviolet (EUV) radiation which has near-zero re...
In the first part of this article we experimentally show that contrast between the very thin layers ...
Beyond EUV lithography at 6.X nm wavelength has a potential to extend EUVL beyond the 11 nm node. To...
Reported is a computational and chemical analysis of near normal incidence reflective multilayer opt...
Key in designing the next generation of EUVL optics, i.e. at the wavelength of 6.x nm, will be match...
We have developed a multilayer mirror for extreme ultraviolet (EUV) radiation (13.5 nm) which has ne...
We have developed two multilayer based solutions that provide reflectivity of EUV radiation and supp...
EUVL at 6.x nm is one of the candidates for the next generation photolithography. Its design require...
Extreme Ultraviolet (EUV) multilayer (ML) technology has been intensively applied in many scientific...
Lithography based on the wavelength of 6.x nm is considered to be a potential extension of the curre...
International audienceRecent extreme ultraviolet sources using high-harmonic generation in a rare ga...
In this paper, the authors report on La/B(4)C multilayer mirrors designed for an incidence angle of ...
In this work we present the design of a Pd/B4C multilayer structure optimized for high reflectance a...
Results on optimization and manufacturing of La B4C multilayers are reported. Such mirrors are prom...
In the first part of this article we experimentally show that contrast between the very thin layers ...
We have developed a multilayer mirror for extreme ultraviolet (EUV) radiation which has near-zero re...
In the first part of this article we experimentally show that contrast between the very thin layers ...
Beyond EUV lithography at 6.X nm wavelength has a potential to extend EUVL beyond the 11 nm node. To...
Reported is a computational and chemical analysis of near normal incidence reflective multilayer opt...
Key in designing the next generation of EUVL optics, i.e. at the wavelength of 6.x nm, will be match...
We have developed a multilayer mirror for extreme ultraviolet (EUV) radiation (13.5 nm) which has ne...
We have developed two multilayer based solutions that provide reflectivity of EUV radiation and supp...
EUVL at 6.x nm is one of the candidates for the next generation photolithography. Its design require...
Extreme Ultraviolet (EUV) multilayer (ML) technology has been intensively applied in many scientific...
Lithography based on the wavelength of 6.x nm is considered to be a potential extension of the curre...
International audienceRecent extreme ultraviolet sources using high-harmonic generation in a rare ga...