This article presents an overview of the fabrication methods of black silicon, their resulting morphologies, and a quantitative comparison of their optoelectronic properties. To perform this quantitative comparison, different groups working on black silicon solar cells have cooperated for this study. The optical absorption and the minority carrier lifetime are used as benchmark parameters. The differences in the fabrication processes plasma etching, chemical etching, or laser processing are discussed and compared with numerical models. Guidelines to optimize the relevant physical parameters, such as the correlation length, optimal height of the nanostructures, and the surface defect densities for optoelectronic applications are given. Black...
Black silicon plasma technology begins to be integrated into the process flow of silicon solar cells...
Black silicon was produced with a lithography-free three-step plasma etching method. The nanocone fo...
Black silicon was produced with a lithography-free three-step plasma etching method. The nanocone fo...
Silicon is the preeminent solar cell material of the day because it is the first semiconductor that ...
Black silicon is expected to be a promising material for photoelectric, photothermic, photocatalytic...
Abstract As a widely used semiconductor material, silicon has been extensively used in many areas, s...
The challenge of future solar cell technologies is the combination of highly efficient cell concepts...
Lataa julkaisu, kun saatavilla.In semiconductor manufacturing, black silicon (bSi) has traditionally...
Black Silicon (BSi) is a semiconductor with a surface modified to get a very low reflectivity and co...
Black silicon nanotextures offer exceptionally low levels of reflectance and are of interest to the ...
Black Silicon (BSi) is a semiconductor with a surface modified to get a very low reflectivity a...
Black silicon nanotextures offer exceptionally low levels of reflectance and are of interest to the ...
Owing to its extremely low light absorption, black silicon has been widely investigated and reported...
Black Silicon (BSi) is a semiconductor with a surface modified to get a very low reflectivity and co...
International Symposium on High Power Laser Ablation (HPLA), Santa Fe, NM, APR 30-MAY 03, 2012Intern...
Black silicon plasma technology begins to be integrated into the process flow of silicon solar cells...
Black silicon was produced with a lithography-free three-step plasma etching method. The nanocone fo...
Black silicon was produced with a lithography-free three-step plasma etching method. The nanocone fo...
Silicon is the preeminent solar cell material of the day because it is the first semiconductor that ...
Black silicon is expected to be a promising material for photoelectric, photothermic, photocatalytic...
Abstract As a widely used semiconductor material, silicon has been extensively used in many areas, s...
The challenge of future solar cell technologies is the combination of highly efficient cell concepts...
Lataa julkaisu, kun saatavilla.In semiconductor manufacturing, black silicon (bSi) has traditionally...
Black Silicon (BSi) is a semiconductor with a surface modified to get a very low reflectivity and co...
Black silicon nanotextures offer exceptionally low levels of reflectance and are of interest to the ...
Black Silicon (BSi) is a semiconductor with a surface modified to get a very low reflectivity a...
Black silicon nanotextures offer exceptionally low levels of reflectance and are of interest to the ...
Owing to its extremely low light absorption, black silicon has been widely investigated and reported...
Black Silicon (BSi) is a semiconductor with a surface modified to get a very low reflectivity and co...
International Symposium on High Power Laser Ablation (HPLA), Santa Fe, NM, APR 30-MAY 03, 2012Intern...
Black silicon plasma technology begins to be integrated into the process flow of silicon solar cells...
Black silicon was produced with a lithography-free three-step plasma etching method. The nanocone fo...
Black silicon was produced with a lithography-free three-step plasma etching method. The nanocone fo...