Oxide coatings have been prepared by PIAD by means of a Leybold Syrus pro 1100 deposition system. Focus was placed on tantalum pentoxide, hafnium oxide, and zirconium oxide films. Coating characterization pursued the determination of the refractive index in the VIS/UV spectral regions, as well as the geometrical film thickness. In situ spectrophotometry was used to obtain information about the shift of the coatings. Measurements of the coating stress as well as EDX characterization have further been performed to complete the picture. Results are presented which provide information about the correlation between deposition parameters (Assistance, choice of working gas) and the optical properties of the films. Correlations between optical and ...
The density of optical coatings is one of the most crucial material-related parameters in interferen...
Structural, optical, and mechanical properties of Al2O3, SiO2, and HfO2 materials prepared by plasma...
Zirconium dioxide thin films were deposited onto fused silica glass substrates by electron-beam assi...
The present study deals with the characterization of hafnia, alumina, and zirconia coatings as well ...
For single layers of SiO2, Nb2O5, and Ta2O5 that are deposited by plasma-assisted reactive magnetron...
Tantalum pentoxide films have been prepared by plasma ion assisted electron beam evaporation, utiliz...
Thin films of SiO2, Ti02, Ta205, ZrO, and the mixed oxide H4 (Merek) have been deposited onto nonhea...
Titanium dioxide, aluminum oxide, and silicon dioxide layers have been prepared by plasma ion assist...
Silicon oxide films were deposited by reactive evaporation of SiO. Parameters such as oxygen partial...
Both the optical and physical properties of thin film optical interference coatings depend upon the ...
Material mixtures offer new possibilities for synthesizing coating materials with tailored optical a...
Properties of single-layer and multilayer Al2O3 / SiO2 coatings deposited by Plasma Ion Assisted Dep...
Aluminium doped ZnO (AZO) alloy films produced by atomic layer deposition (ALD) are analysed by glow...
New and more complex requirements for multilayer optical coatings are raised due to development of l...
The aim of the studies was the deposition of oxide films for use as optical coatings by means of oxy...
The density of optical coatings is one of the most crucial material-related parameters in interferen...
Structural, optical, and mechanical properties of Al2O3, SiO2, and HfO2 materials prepared by plasma...
Zirconium dioxide thin films were deposited onto fused silica glass substrates by electron-beam assi...
The present study deals with the characterization of hafnia, alumina, and zirconia coatings as well ...
For single layers of SiO2, Nb2O5, and Ta2O5 that are deposited by plasma-assisted reactive magnetron...
Tantalum pentoxide films have been prepared by plasma ion assisted electron beam evaporation, utiliz...
Thin films of SiO2, Ti02, Ta205, ZrO, and the mixed oxide H4 (Merek) have been deposited onto nonhea...
Titanium dioxide, aluminum oxide, and silicon dioxide layers have been prepared by plasma ion assist...
Silicon oxide films were deposited by reactive evaporation of SiO. Parameters such as oxygen partial...
Both the optical and physical properties of thin film optical interference coatings depend upon the ...
Material mixtures offer new possibilities for synthesizing coating materials with tailored optical a...
Properties of single-layer and multilayer Al2O3 / SiO2 coatings deposited by Plasma Ion Assisted Dep...
Aluminium doped ZnO (AZO) alloy films produced by atomic layer deposition (ALD) are analysed by glow...
New and more complex requirements for multilayer optical coatings are raised due to development of l...
The aim of the studies was the deposition of oxide films for use as optical coatings by means of oxy...
The density of optical coatings is one of the most crucial material-related parameters in interferen...
Structural, optical, and mechanical properties of Al2O3, SiO2, and HfO2 materials prepared by plasma...
Zirconium dioxide thin films were deposited onto fused silica glass substrates by electron-beam assi...