Plasma deposition processes

A review with 29 refs. focused on the deposition of Si films and thin films of amorphous hydrogenated carbon. With plasma deposition, many materials can be deposited, varying from cryst. (e.g. diamond, graphite) to polycryst. and amorphous films. Plasmas offer nearly unlimited choice of materials, a large versatility in conditions and efficient use of monomers and energy. The various approaches used nowadays are discussed together with a crit. evaluation of the various processes occurring in the plasma and in the plasma wall interaction. The various subprocesses (e.g., ionization, fragmentation, adsorption, and desorption) and recirculation are illustrated with examples taken from high d. plasma deposition. Conclusions were drawn on future outlook. [on SciFinder (R)