The ability to fabricate heterostructured nanomaterials with each layer of the structure having some specific function, i.e. energy storage, charge collection, etc., has recently attracted great interest. Of the techniques capable of this type of process, atomic layer deposition (ALD) remains unique due to its monolayer thickness control, extreme conformality, and wide variety of available materials. This work aims at using ALD to fabricate fully integrated heterostructured nanomaterials. To that end, two ALD processes, using a new and novel precursor, bis(2,6,6-trimethyl-cyclohexadienyl)ruthenium, were developed for Ru and RuO2 showing stable growth rates of 0.5 Å/cycle and 0.4 Å/cycle respectively. Both process are discussed and compar...
Ruthenium (Ru) is regarded as an electrode candidate on ultrahigh-k SrTiO3 dielectric films for futu...
We synthesized nanoscale TiO2-RuO2 alloys by atomic layer deposition (ALD) that possess a high work ...
The metalorganic precursor cyclopentadienylethyl(dicarbonyl)ruthenium (CpRu(CO)(2)Et) was used to de...
Atomic layer deposition (ALD) of ruthenium is of interest for various applications in nanoelectronic...
The metalorganic precursor cyclopentadienylethyl(dicarbonyl)ruthenium (CpRu(CO)2Et) was used to deve...
Growth mechanism of chemically-driven RuO2 nanowires is explored and used to fabricate three-dimensi...
Pushing lithium-ion battery (LIB) technology forward to its fundamental scaling limits requires the ...
We fabricated metallic nanostructures directly on Si substrates through a hybrid nanoprocess combini...
Ruthenium (Ru) and ruthenium oxide (RuO<sub>2</sub>) thin films were grown by atomic layer depositio...
Atomic layer deposition (ALD) of ruthenium dioxide (RuO2) thin films using metalorganic precursors a...
Thin ruthenium oxide film deposition on 100 nm SiO2 substrate by thermal atomic layer deposition (AL...
Vapour-phase chemical deposition techniques rely on an interplay of adsorption, diffusion, reaction,...
In this paper we report a low temperature (100 degrees C) ALD process for Ru using the RuO4-precurso...
Area selective atomic layer deposition (AS-ALD) is an interesting bottom-up approach due to its self...
Atomic layer deposition (ALD) of ruthenium dioxide (RuO2) thin films using metalorganic precursors a...
Ruthenium (Ru) is regarded as an electrode candidate on ultrahigh-k SrTiO3 dielectric films for futu...
We synthesized nanoscale TiO2-RuO2 alloys by atomic layer deposition (ALD) that possess a high work ...
The metalorganic precursor cyclopentadienylethyl(dicarbonyl)ruthenium (CpRu(CO)(2)Et) was used to de...
Atomic layer deposition (ALD) of ruthenium is of interest for various applications in nanoelectronic...
The metalorganic precursor cyclopentadienylethyl(dicarbonyl)ruthenium (CpRu(CO)2Et) was used to deve...
Growth mechanism of chemically-driven RuO2 nanowires is explored and used to fabricate three-dimensi...
Pushing lithium-ion battery (LIB) technology forward to its fundamental scaling limits requires the ...
We fabricated metallic nanostructures directly on Si substrates through a hybrid nanoprocess combini...
Ruthenium (Ru) and ruthenium oxide (RuO<sub>2</sub>) thin films were grown by atomic layer depositio...
Atomic layer deposition (ALD) of ruthenium dioxide (RuO2) thin films using metalorganic precursors a...
Thin ruthenium oxide film deposition on 100 nm SiO2 substrate by thermal atomic layer deposition (AL...
Vapour-phase chemical deposition techniques rely on an interplay of adsorption, diffusion, reaction,...
In this paper we report a low temperature (100 degrees C) ALD process for Ru using the RuO4-precurso...
Area selective atomic layer deposition (AS-ALD) is an interesting bottom-up approach due to its self...
Atomic layer deposition (ALD) of ruthenium dioxide (RuO2) thin films using metalorganic precursors a...
Ruthenium (Ru) is regarded as an electrode candidate on ultrahigh-k SrTiO3 dielectric films for futu...
We synthesized nanoscale TiO2-RuO2 alloys by atomic layer deposition (ALD) that possess a high work ...
The metalorganic precursor cyclopentadienylethyl(dicarbonyl)ruthenium (CpRu(CO)(2)Et) was used to de...