Silicon nanophotonic wire structures fabricated by 193nm optical lithography
- Selvaraja, shankar kumar
- Jaenen, Patrick
- Beckx, Stephan
- Bogaerts, Wim
- Dumon, Pieter
- Van Thourout, Dries
- Bates, Roel
Publication date
January 2007
DOI Publisher
Institute of Electrical and Electronics Engineers (IEEE) ISSN
1092-8081Abstract
We demonstrate the use of 193nm optical lithography for fabricating nanophotonic wire structures on sificon-on-insulator (SOI) technology. We present fabrication and measurement result on wire devices. We report a propagation loss of 2.8dB/cm for 450X220nm photonic wire
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