The influence of the starting conditions and sheath thickness on the magnetron discharge is investigated using a Monte Carlo program. The average number of ionizations caused by an electron emitted from the cathode is calculated. It is shown that the sheath thickness plays a crucial role in the generation of ions and the sustainment of the discharge. An analytical formula is obtained which relates discharge voltage, sheath thickness and ion-induced secondary electron coefficient. From it, a natural explanation for the very steep current-voltage (I-V) characteristic in magnetron discharges follows. Comparison with experiment suggests an anomalous diffusion of electrons across the sheath. The simulations were done for a rotatable cylindrical ...
The dynamic behaviors of electrons in a miniature Penning ion source model are analyzed by the parti...
International audienceMagnetron sputtering is a wide-spread plasma-based thin film deposition...
Although magnetron sputtering has been established in the 80´s, the dynamics of magnetron discharge ...
The influence of the starting conditions and sheath thickness on the magnetron discharge is investig...
Current-voltage characteristics of the planar magnetron are studied experimentally and by numerical ...
In modeling direct current (dc) discharges, such as dc magnetrons, a current-limiting device is ofte...
The magnetic field is a key feature that distinguishes magnetron sputtering from simple diode sputte...
Abstract –- A phenomenological model of DC magnetron discharge has been created on basis of probe me...
Abstract Simple analytical formulas are proposed to describe the plasma potential in a steady-state ...
In this paper, some modelling approaches to describe direct current (dc) magnetron discharges develo...
In spite of being an established thin film coating technology for more than two decades, magnetron s...
The sheath region of a Hall discharge is studied in a four-dimensional phase space which consists of...
A magnetically confined dc plasma discharge sustained by a thermionic source was investigated using a...
The objective of this work was to study dc and High Power Impulse Magnetron Sputtering (HiPIMS) plas...
Planar magnetron cathodes have arching magnetic field lines which concentrate plasma density near th...
The dynamic behaviors of electrons in a miniature Penning ion source model are analyzed by the parti...
International audienceMagnetron sputtering is a wide-spread plasma-based thin film deposition...
Although magnetron sputtering has been established in the 80´s, the dynamics of magnetron discharge ...
The influence of the starting conditions and sheath thickness on the magnetron discharge is investig...
Current-voltage characteristics of the planar magnetron are studied experimentally and by numerical ...
In modeling direct current (dc) discharges, such as dc magnetrons, a current-limiting device is ofte...
The magnetic field is a key feature that distinguishes magnetron sputtering from simple diode sputte...
Abstract –- A phenomenological model of DC magnetron discharge has been created on basis of probe me...
Abstract Simple analytical formulas are proposed to describe the plasma potential in a steady-state ...
In this paper, some modelling approaches to describe direct current (dc) magnetron discharges develo...
In spite of being an established thin film coating technology for more than two decades, magnetron s...
The sheath region of a Hall discharge is studied in a four-dimensional phase space which consists of...
A magnetically confined dc plasma discharge sustained by a thermionic source was investigated using a...
The objective of this work was to study dc and High Power Impulse Magnetron Sputtering (HiPIMS) plas...
Planar magnetron cathodes have arching magnetic field lines which concentrate plasma density near th...
The dynamic behaviors of electrons in a miniature Penning ion source model are analyzed by the parti...
International audienceMagnetron sputtering is a wide-spread plasma-based thin film deposition...
Although magnetron sputtering has been established in the 80´s, the dynamics of magnetron discharge ...