Add to ORKGThe characterization of an atmospheric pressure direct current (DC) plasma jet operating in nitrogen and its application for thin film deposition is investigated. The gas temperature and the vibrational temperature of the nitrogen jet in the active zone and in the afterglow are determined by means of optical emission spectroscopy. Thin films are deposited using the plasma jet with TMDSO as precursor at atmospheric pressure. There is a linear correlation between deposition time and film thickness. The process has a higher deposition rate at a higher discharge power. The chemical characteristics of the thin films are analyzed by XPS
A time modulated RF atmospheric pressure plasma jet, operated in ambient air with a flow of argon wi...
A low temperature plasma assisted atomic layer deposition process from tetrakis (dimethyla...
This work represents a concise overview on the results achieved by the authors over the last years o...
Silicon-containing thin films are applied in various different fields, such as packaging, biomedical...
This work deals with the deposition of thin films using an atmospheric pressure direct current nitro...
The properties of an atmospheric pressure direct current (DC) plasma jet operating in N2 and dry air...
An atmospheric pressure direct current plasma jet is produced in nitrogen and air. The active region...
Cold atmospheric pressure plasma jets were capable of generating cold plasma plumes that were not co...
The low pressure DC pulsed or RF pulsed modulated hollow cathode plasma jets worked on the principle...
A double layer DBD plasma jet driven by a pulsed generator is used for SiO x thin film deposition. ...
In this paper, an experimental study is presented to characterize a commercially available atmospher...
This paper deals with the development of a low-cost atmospheric non-thermal plasma jet (ANPJ) which ...
International audienceIn the context of nitrogen-rich amorphous carbon thin films ultrafast pulsed l...
Because of its high energy density direct current(dc)thermal plasmas are widely accepted as a proce...
A time modulated RF atmospheric pressure plasma jet, operated in ambient air with a flow of argon wi...
A low temperature plasma assisted atomic layer deposition process from tetrakis (dimethyla...
This work represents a concise overview on the results achieved by the authors over the last years o...
Silicon-containing thin films are applied in various different fields, such as packaging, biomedical...
This work deals with the deposition of thin films using an atmospheric pressure direct current nitro...
The properties of an atmospheric pressure direct current (DC) plasma jet operating in N2 and dry air...
An atmospheric pressure direct current plasma jet is produced in nitrogen and air. The active region...
Cold atmospheric pressure plasma jets were capable of generating cold plasma plumes that were not co...
The low pressure DC pulsed or RF pulsed modulated hollow cathode plasma jets worked on the principle...
A double layer DBD plasma jet driven by a pulsed generator is used for SiO x thin film deposition. ...
In this paper, an experimental study is presented to characterize a commercially available atmospher...
This paper deals with the development of a low-cost atmospheric non-thermal plasma jet (ANPJ) which ...
International audienceIn the context of nitrogen-rich amorphous carbon thin films ultrafast pulsed l...
Because of its high energy density direct current(dc)thermal plasmas are widely accepted as a proce...
A time modulated RF atmospheric pressure plasma jet, operated in ambient air with a flow of argon wi...
A low temperature plasma assisted atomic layer deposition process from tetrakis (dimethyla...
This work represents a concise overview on the results achieved by the authors over the last years o...