We report wavelength selective device nonuniformity of 1 nm over a 200 mm SOI wafer using CMOS fabrication technology. We also report correlation between device density and nonuniformity
We report two-fold improvement in Si photonic device uniformity over a 200mm SOI wafer through locat...
Light modulators and switches based on silicon photonic microrings can be fabricated with the conven...
We present our recent results on Si thickness uniformity improvement in a SOI wafer. We improved the...
We report wavelength selective device nonuniformity of 1 nm over a 200 mm SOI wafer using CMOS fabri...
We report subnanometer linewidth uniformity in silicon nanophotonics devices fabricated using high-v...
Abstract—We report subnanometer linewidth uniformity in sil-icon nanophotonics devices fabricated us...
We describe the correlation between the measured width of silicon waveguides fabricated with 193 nm ...
Abstract: This study of 371 identical resonators on a 16x9 mm chip fabricated by a silicon photonics...
Our burgeoning appetite for data relentlessly demands exponential scaling of computing and communica...
On-chip optical and photonic devices are key to major advances in fields as diverse as optical commu...
We propose a procedure for characterizing fabrication deviations within a chip and among different c...
In recent years, silicon photonics has begun to transition from research to commercial-ization. Deca...
Nanophotonics promise a dramatic scale reduction compared to contemporary photonic components. This ...
Using an advanced 300mm CMOS-platform, we report record-low and highly-uniform propagation loss: 0.4...
In OPN’s December “Optics in 2015” review of interesting research conducted in the previous year, St...
We report two-fold improvement in Si photonic device uniformity over a 200mm SOI wafer through locat...
Light modulators and switches based on silicon photonic microrings can be fabricated with the conven...
We present our recent results on Si thickness uniformity improvement in a SOI wafer. We improved the...
We report wavelength selective device nonuniformity of 1 nm over a 200 mm SOI wafer using CMOS fabri...
We report subnanometer linewidth uniformity in silicon nanophotonics devices fabricated using high-v...
Abstract—We report subnanometer linewidth uniformity in sil-icon nanophotonics devices fabricated us...
We describe the correlation between the measured width of silicon waveguides fabricated with 193 nm ...
Abstract: This study of 371 identical resonators on a 16x9 mm chip fabricated by a silicon photonics...
Our burgeoning appetite for data relentlessly demands exponential scaling of computing and communica...
On-chip optical and photonic devices are key to major advances in fields as diverse as optical commu...
We propose a procedure for characterizing fabrication deviations within a chip and among different c...
In recent years, silicon photonics has begun to transition from research to commercial-ization. Deca...
Nanophotonics promise a dramatic scale reduction compared to contemporary photonic components. This ...
Using an advanced 300mm CMOS-platform, we report record-low and highly-uniform propagation loss: 0.4...
In OPN’s December “Optics in 2015” review of interesting research conducted in the previous year, St...
We report two-fold improvement in Si photonic device uniformity over a 200mm SOI wafer through locat...
Light modulators and switches based on silicon photonic microrings can be fabricated with the conven...
We present our recent results on Si thickness uniformity improvement in a SOI wafer. We improved the...