The Ba0.8Sr0.2TiO3 thin films were grown on the Pt–Si substrate at 700 °C by using a pulsed laser deposition technique at different oxygen partial pressure (PO2) in the range of 1–20 Pa and their properties were investigated. It is observed that the PO2 during the deposition plays an important role on the tetragonal distortion ratio, surface morphology, dielectric permittivity, ferroelectric polarization, switching response, and leakage currents of the films. With an increase in PO2, the in-plane strain for the BST films changes from tensile to compressive. The films grown at 7.5 Pa show the optimum dielectric and ferroelectric properties and also exhibit the good polarization stability. It is assumed that a reasonable compressi...
The ferroelectric phase of HfO2 is generally stabilized in polycrystalline films, which typically ex...
[[abstract]]A two-step pulsed laser deposition (PLD) process, including PLD at a substrate temperatu...
The aim of this thesis was to produce thin film ferroelectric capacitors with deliberate chemical he...
The Ba0.8Sr0.2TiO3 thin films were grown on the Pt–Si substrate at 700 °C by using a pulsed laser d...
The crystal structure of BaTiO3 thin films grown by pulsed laser deposition on MgO substrates was fo...
The crystal structure of BaTiO3 thin films grown by pulsed laser deposition on MgO substrates was fo...
The effect of pulse amplitude on the ferroelectric and switching properties of pulsed laser deposite...
In this work, the observations of different resistive switching polarities of epitaxial BaTiO3 (BTO)...
The effect of platinum (Pt) bottom electrode texture on the tetragonality, dielectric, ferroelectric...
AbstractThe polarization behavior of barium titanate (BTO) thin films fabricated using pulsed laser ...
Epitaxial BaZrxTi1−xO3 (BZTO) thin films with Zr contents of x=0, x=0.12 and x=0.2 were grown by pul...
The effect of pulse amplitude on the ferroelectric and switching properties of pulsed laser deposit...
Ultrathin ferroelectric (FE) films have recently got much attention in the context of the non-volati...
Lanthanum-doped lead zirconate titanate stannate antiferroelectric thin films of ~420 nm with compos...
Ultrathin ferroelectric (FE) films have recently got much attention in the context of the non-volati...
The ferroelectric phase of HfO2 is generally stabilized in polycrystalline films, which typically ex...
[[abstract]]A two-step pulsed laser deposition (PLD) process, including PLD at a substrate temperatu...
The aim of this thesis was to produce thin film ferroelectric capacitors with deliberate chemical he...
The Ba0.8Sr0.2TiO3 thin films were grown on the Pt–Si substrate at 700 °C by using a pulsed laser d...
The crystal structure of BaTiO3 thin films grown by pulsed laser deposition on MgO substrates was fo...
The crystal structure of BaTiO3 thin films grown by pulsed laser deposition on MgO substrates was fo...
The effect of pulse amplitude on the ferroelectric and switching properties of pulsed laser deposite...
In this work, the observations of different resistive switching polarities of epitaxial BaTiO3 (BTO)...
The effect of platinum (Pt) bottom electrode texture on the tetragonality, dielectric, ferroelectric...
AbstractThe polarization behavior of barium titanate (BTO) thin films fabricated using pulsed laser ...
Epitaxial BaZrxTi1−xO3 (BZTO) thin films with Zr contents of x=0, x=0.12 and x=0.2 were grown by pul...
The effect of pulse amplitude on the ferroelectric and switching properties of pulsed laser deposit...
Ultrathin ferroelectric (FE) films have recently got much attention in the context of the non-volati...
Lanthanum-doped lead zirconate titanate stannate antiferroelectric thin films of ~420 nm with compos...
Ultrathin ferroelectric (FE) films have recently got much attention in the context of the non-volati...
The ferroelectric phase of HfO2 is generally stabilized in polycrystalline films, which typically ex...
[[abstract]]A two-step pulsed laser deposition (PLD) process, including PLD at a substrate temperatu...
The aim of this thesis was to produce thin film ferroelectric capacitors with deliberate chemical he...