Resumo e posterAluminium oxynitride is known to be a ceramic material with high strength and hardness, resulting from a stabilization of alumina (Al2O3) with nitrogen, in a cubic spinel structure, at thermodynamic conditions very different from those found in low plasma temperature deposition processes. Beyond this stable phase of AlNxOy, the available knowledge on this system is still very reduced and the interest on studding this material arises from the fact that it may combine some of the advantages of the three base systems, Al, AlN and Al2O3, by changing the concentration of aluminium, oxygen and nitrogen in the films. In fact, recent studies showed that AlNxOy thin films deposited by physical vapour deposition presents unusual chang...
International audienceThe dielectric properties of aluminium oxide (Al2O3) thin films obtained by pl...
Thin films of AlOxNy were deposited by magnetron sputtering in a wide composition range. Different s...
International audienceDirect current magnetron sputtering was used to produce AlNxOy thin films, usi...
Resumo e posterAluminium, Al, is a metallic material used in a large variety of technological fields...
Comunicação oral apresentada no E-MRS 2013 Spring Meeting, Symposium S, em Strasbourg, FranceThe aim...
The thermal stability of two AlyTi1- y(OxN1-x) layers prepared by cathodic vacuum arc deposition wi...
Comunicação oralAluminium oxide (Al2O3) is an insulator material, with high electrical breakdown, la...
Metallic (Me) oxynitrides (MeNxOy) are an attractive class of materials due to a unique set of vers...
Apresentação em posterAl2O3 is an insulator material, with high electrical breakdown and large band ...
Aluminium oxide thin films had been prepared by off-plane filtered cathodic vacuum arc (FCVA) under ...
Aluminium oxide thin films had been prepared by off-plane filtered cathodic vacuum arc (FCVA) under ...
The AlNxOy system offers the possibility to obtain a wide range of responses, by tailoring the prope...
In this subchapter is discussed some characteristics and properties of AlOxNy thin films produced by...
Abstract. The AlNxOy system offers the possibility to obtain a wide range of responses, by tailoring...
International audienceThe dielectric properties of aluminium oxide (Al2O3) thin films obtained by pl...
International audienceThe dielectric properties of aluminium oxide (Al2O3) thin films obtained by pl...
Thin films of AlOxNy were deposited by magnetron sputtering in a wide composition range. Different s...
International audienceDirect current magnetron sputtering was used to produce AlNxOy thin films, usi...
Resumo e posterAluminium, Al, is a metallic material used in a large variety of technological fields...
Comunicação oral apresentada no E-MRS 2013 Spring Meeting, Symposium S, em Strasbourg, FranceThe aim...
The thermal stability of two AlyTi1- y(OxN1-x) layers prepared by cathodic vacuum arc deposition wi...
Comunicação oralAluminium oxide (Al2O3) is an insulator material, with high electrical breakdown, la...
Metallic (Me) oxynitrides (MeNxOy) are an attractive class of materials due to a unique set of vers...
Apresentação em posterAl2O3 is an insulator material, with high electrical breakdown and large band ...
Aluminium oxide thin films had been prepared by off-plane filtered cathodic vacuum arc (FCVA) under ...
Aluminium oxide thin films had been prepared by off-plane filtered cathodic vacuum arc (FCVA) under ...
The AlNxOy system offers the possibility to obtain a wide range of responses, by tailoring the prope...
In this subchapter is discussed some characteristics and properties of AlOxNy thin films produced by...
Abstract. The AlNxOy system offers the possibility to obtain a wide range of responses, by tailoring...
International audienceThe dielectric properties of aluminium oxide (Al2O3) thin films obtained by pl...
International audienceThe dielectric properties of aluminium oxide (Al2O3) thin films obtained by pl...
Thin films of AlOxNy were deposited by magnetron sputtering in a wide composition range. Different s...
International audienceDirect current magnetron sputtering was used to produce AlNxOy thin films, usi...