Add to ORKGThis paper presents fabrication of microcantilevers on {100} oriented Si substrate by bulk micromachining. Two types of CCC (Convex Corner Compensation) structures, namely ⟨100⟩ oriented simple beam and structure using symmetric rectangular blocks oriented in the ⟨110⟩ direction at the apex of the square peg have been analyzed. Etching solution has been KOH water solution (80 wt. %) at etching temperature of 80 o C. Detailed construction and etching behavior of both structures have been given and explained
Compensation structures are a necessity for wet anisotropic etching of silicon in order to prevent t...
[[abstract]]This study presents a bulk micromachining fabrication platform on the (100) single cryst...
In creating mirrored silicon structures for micro-optics, the smoothness of the surface and etch rat...
This paper presents microcantilever fabrication on {100} oriented Si substrate using bulk micromachi...
Wet anisotropic etching based silicon micromachining is an important technique to fabricate freestan...
In wet anisotropic etching based silicon bulk micromachining, undercutting, which has both advantage...
This paper presents etching of convex corners with sides along and crystallographic directions in ...
Abstract\ud \ud We combine experiment, theory and simulation to design and fabricate 3D structures w...
For a long time wet bulk-micromachining has been an easy and cost-effective method for fabricating s...
The planes occurring at convex corners during anisotropic etching of (100)-silicon in aqueous KOH we...
In this paper, a method for the fabrication of convex corners in (100)-Silicon in KOH-etchant of (10...
[[abstract]]In general, convex corner structures and non {111} crystal planes will be undercut durin...
This paper investigates the anistropic etching characteristics and convex corner undercut mechanism ...
In this work, we have developed a novel anisotropic wet etching process for the fabrication of MEMS ...
A maskless convex corner compensation technique in a 25 wt% TMAH water solution at the temperature o...
Compensation structures are a necessity for wet anisotropic etching of silicon in order to prevent t...
[[abstract]]This study presents a bulk micromachining fabrication platform on the (100) single cryst...
In creating mirrored silicon structures for micro-optics, the smoothness of the surface and etch rat...
This paper presents microcantilever fabrication on {100} oriented Si substrate using bulk micromachi...
Wet anisotropic etching based silicon micromachining is an important technique to fabricate freestan...
In wet anisotropic etching based silicon bulk micromachining, undercutting, which has both advantage...
This paper presents etching of convex corners with sides along and crystallographic directions in ...
Abstract\ud \ud We combine experiment, theory and simulation to design and fabricate 3D structures w...
For a long time wet bulk-micromachining has been an easy and cost-effective method for fabricating s...
The planes occurring at convex corners during anisotropic etching of (100)-silicon in aqueous KOH we...
In this paper, a method for the fabrication of convex corners in (100)-Silicon in KOH-etchant of (10...
[[abstract]]In general, convex corner structures and non {111} crystal planes will be undercut durin...
This paper investigates the anistropic etching characteristics and convex corner undercut mechanism ...
In this work, we have developed a novel anisotropic wet etching process for the fabrication of MEMS ...
A maskless convex corner compensation technique in a 25 wt% TMAH water solution at the temperature o...
Compensation structures are a necessity for wet anisotropic etching of silicon in order to prevent t...
[[abstract]]This study presents a bulk micromachining fabrication platform on the (100) single cryst...
In creating mirrored silicon structures for micro-optics, the smoothness of the surface and etch rat...