Microstrucure and thermal features a-Si:H and nc-Si:H thin films produced by r.f. sputtering

Thaiyalnayaki, V.
Cerqueira, M. F.
Macedo, Francisco
Ferreira, J. A.

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Publication date

January 2006

DOI

10.4028/www.scientific.net/msf.514-516.23

Publisher

Trans Tech Publications, Ltd.

ISSN

1662-9752

Journal

issn:0255-5476

Abstract

Amorphous and nanocrystalline silicon thin films have been produced by reactive r.f. sputtering and their microstructure, optical and thermal properties were evaluated. A good correlation was found between the microstructure determined by Raman spectroscopy and X-ray diffraction and the thermal transport parametersFCT Project POCTI / CTM / 39395 / 200

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Microstrucure and thermal features a-Si:H and nc-Si:H thin films produced by r.f. sputtering

Abstract

Extracted data

Microstrucure and thermal features a-Si:H and nc-Si:H thin films produced by r.f. sputtering

Abstract

Extracted data

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