Structural study of Si1-xGex nanocrystals embedded in SiO2 films

We have investigated the structural properties of Si1−xGex nanocrystals formed in an amorphous SiO2 matrix by magnetron sputtering deposition. The influence of deposition parameters on nanocrystal size, shape, arrangement and internal structure was examined by X-ray diffraction, Raman spectroscopy, grazing incidence small angle X-ray scattering, and high resolution transmission electron microscopy. We found conditions for the formation of spherical Si1−xGex nanocrystals with average sizes between 3 and 13 nm, uniformly distributed in the matrix. In addition we have shown the influence of deposition parameters on average nanocrystal size and Ge content x.PTDC/FIS/70194/2006 financed by Portuguese Foundation for Science and Technology (FCT)Bilateral Cooperation Programme BC/CRUP — B 26/08 financed by British Council and Council of Portuguese's RectorsProposal No. RII3-CT-2004-506008 at Elettra Synchrotron Radiation InfrastructureFCT grant FRH/BD/29657/2006National Foundation for Science, Higher Education and Technological Development of the Republic of Croati