The evolution of the nanoscale structure and the chemical bonds formed in Ti–C–N–O films grown by reactive sputtering were studied as a function of the composition of the reactive atmosphere by increasing the partial pressure of an O2+N2 gas mixture from 0 up to 0.4 Pa, while that of acetylene (carbon source) was constant. The amorphisation of the films observed by transmission electron microscopy was confirmed by micro- Raman spectroscopy, but it was not the only effect associated to the increase of the O2+N2 partial pressure. The chemical environment of titanium and carbon, analysed by X-ray photoemission spectroscopy, also changes due to the higher affinity of Ti towards oxygen and nitrogen than to carbon. This gives rise to the appea...
Ti–Si–C–ON films were deposited by DC reactive magnetron sputtering using different partial pressure...
Owing to its singular and (to some extend) adaptable characteristics, titanium oxynitride (TixOyNz) ...
Phase formation, morphology, and optical properties of Ti(O,N) thin films with varied oxygen-to- nit...
Dark Ti-C-O-N thin films were deposited by dc reactive magnetron sputtering. A titanium target was s...
This work reports on the study of thermal stability of dark decorative Ti(C,O,N) thin films produce...
TiCxOy films with various O/Ti ratios have been deposited by DC magnetron sputtering, using C pieces...
The main purpose of this work consists in the preparation of titanium oxycarbide, TiCxOy, thin films...
The main purpose of this work consists in the preparation of single layered titanium oxycarbide, TiC...
International audienceReactive magnetron sputtering was used to deposit titanium oxycarbide thin fil...
International audienceDirect current reactive magnetron sputtering was implemented to successfully d...
Titanium oxynitride thin films have been deposited by low-pressure metalorganic chemical vapour depo...
International audienceIncorporation of oxygen into TiN lattice results in formation of titanium oxyn...
Thin films of titanium oxynitride were successfully prepared by dc reactive magnetron sputtering usi...
Titanium oxynitride TiNxOy thin films have been deposited by DC-pulsed magnetron sputtering from Ti ...
The microstructure and chemical composition of sputtered thin films are strongly correlated with the...
Ti–Si–C–ON films were deposited by DC reactive magnetron sputtering using different partial pressure...
Owing to its singular and (to some extend) adaptable characteristics, titanium oxynitride (TixOyNz) ...
Phase formation, morphology, and optical properties of Ti(O,N) thin films with varied oxygen-to- nit...
Dark Ti-C-O-N thin films were deposited by dc reactive magnetron sputtering. A titanium target was s...
This work reports on the study of thermal stability of dark decorative Ti(C,O,N) thin films produce...
TiCxOy films with various O/Ti ratios have been deposited by DC magnetron sputtering, using C pieces...
The main purpose of this work consists in the preparation of titanium oxycarbide, TiCxOy, thin films...
The main purpose of this work consists in the preparation of single layered titanium oxycarbide, TiC...
International audienceReactive magnetron sputtering was used to deposit titanium oxycarbide thin fil...
International audienceDirect current reactive magnetron sputtering was implemented to successfully d...
Titanium oxynitride thin films have been deposited by low-pressure metalorganic chemical vapour depo...
International audienceIncorporation of oxygen into TiN lattice results in formation of titanium oxyn...
Thin films of titanium oxynitride were successfully prepared by dc reactive magnetron sputtering usi...
Titanium oxynitride TiNxOy thin films have been deposited by DC-pulsed magnetron sputtering from Ti ...
The microstructure and chemical composition of sputtered thin films are strongly correlated with the...
Ti–Si–C–ON films were deposited by DC reactive magnetron sputtering using different partial pressure...
Owing to its singular and (to some extend) adaptable characteristics, titanium oxynitride (TixOyNz) ...
Phase formation, morphology, and optical properties of Ti(O,N) thin films with varied oxygen-to- nit...