The piezoresistive response of n- and p-type hydrogenated nanocrystalline silicon thin films, deposited by hot-wire (HW) and plasma-enhanced chemical vapor deposition (PECVD) on thermally oxidized silicon wafers, has been studied using four-point bending tests. The piezoresistive gauge factor (GF) was measured on patterned thin-film micro-resistors rotated by an angle θ with respect to the principal strain axis. Both longitudinal (GFL) and transverse (GFT) GFs, corresponding to θ = 0° and 90°, respectively, are negative for n-type and positive for p-type films. For other values of θ (30°, 45°, 120°, and 135°) GFs have the same signal as GFL and GFT and their value is proportional to the normal strain associated with planes rotated by θ rela...
Hot-wire chemical vapour deposition (HWCVD) is a promising technique that permits polycrystalline si...
Nanocrystalline silicon (nc-Si) thin films were prepared on one inch square glass and silicon substr...
Nanocrystalline silicon (nc-Si) thin films were prepared on one inch square glass and silicon substr...
The piezoresistive response of n- and p-type hydrogenated nanocrystalline silicon thin films, deposi...
N-type hydrogenated nanocrystalline silicon thin film piezoresistors, with gauge factor −28, were de...
A full investigation into the piezoresistive effect in polycrystalline silicon is described. A theor...
Aluminum-induced crystallization (AIC) has been used to achieve device quality nc-Si thin films, at ...
Although the various effects of strain on silicon are subject of intensive research since the 1950s ...
Abstract-In this paper, we successfully applied the PECVD method to deposit nano-crystalline silicon...
ABSTRACT: The influence of mechanical stress on PECVD thin film layers (250 to 500 nm) of hydrogenat...
A wide variety of apparently contradictory piezoresistance (PZR) behaviors have been reported in p-t...
Hot-wire chemical vapour deposition (HWCVD) is a promising technique that permits polycrystalline si...
Nanocrystalline silicon (nc-Si) thin films were prepared on one inch square glass and silicon substr...
Nanocrystalline silicon (nc-Si) thin films were prepared on one inch square glass and silicon substr...
AbstractTo improve the accuracy and stability of piezoresistive sensors based on polysilicon nanosiz...
Hot-wire chemical vapour deposition (HWCVD) is a promising technique that permits polycrystalline si...
Nanocrystalline silicon (nc-Si) thin films were prepared on one inch square glass and silicon substr...
Nanocrystalline silicon (nc-Si) thin films were prepared on one inch square glass and silicon substr...
The piezoresistive response of n- and p-type hydrogenated nanocrystalline silicon thin films, deposi...
N-type hydrogenated nanocrystalline silicon thin film piezoresistors, with gauge factor −28, were de...
A full investigation into the piezoresistive effect in polycrystalline silicon is described. A theor...
Aluminum-induced crystallization (AIC) has been used to achieve device quality nc-Si thin films, at ...
Although the various effects of strain on silicon are subject of intensive research since the 1950s ...
Abstract-In this paper, we successfully applied the PECVD method to deposit nano-crystalline silicon...
ABSTRACT: The influence of mechanical stress on PECVD thin film layers (250 to 500 nm) of hydrogenat...
A wide variety of apparently contradictory piezoresistance (PZR) behaviors have been reported in p-t...
Hot-wire chemical vapour deposition (HWCVD) is a promising technique that permits polycrystalline si...
Nanocrystalline silicon (nc-Si) thin films were prepared on one inch square glass and silicon substr...
Nanocrystalline silicon (nc-Si) thin films were prepared on one inch square glass and silicon substr...
AbstractTo improve the accuracy and stability of piezoresistive sensors based on polysilicon nanosiz...
Hot-wire chemical vapour deposition (HWCVD) is a promising technique that permits polycrystalline si...
Nanocrystalline silicon (nc-Si) thin films were prepared on one inch square glass and silicon substr...
Nanocrystalline silicon (nc-Si) thin films were prepared on one inch square glass and silicon substr...