This work aims to study the cytocompatibility of protective coatings obtained in argon and nitrogen atmospheres on a TiNi surface. Particular attention is paid to comparing the interaction of cell culture with coatings and an uncoated TiNi sample, using for comparison the number of viable cells on the surface, the phase composition, structure, wettability, surface charge and topography. The Ti/Ni/Ti nanolaminate was deposited on a TiNi substrate by magnetron sputtering. Reaction annealing of Ti/Ni/Ti nanolaminate on a TiNi substrate, when heated to 900 ◦C in argon, leads to the formation of a dense two-layer coating 2.0–2.1 µm thick: layer I (TiO + Ti2N), layer II (Ti4Ni2 O(N)). Reaction annealing in nitrogen leads to the formation of a thi...
International audienceCurrent research directions with the aim of extending the applications of tita...
This work studies the effect that argon and nitrogen atmospheres have on the structure, phase compos...
Ti–Si–C–ON films were deposited by DC reactive magnetron sputtering using different partial pressure...
This work aims to study the cytocompatibility of protective coatings obtained in argon and nitrogen ...
In the study, gradient coatings with a nanometer thickness were successfully synthesized from Ti/Ni/...
A gradient magnetron-sputtered three-layer laminated Ti–Ni–Ti coating is formed by the method of rea...
The experiments conducted to obtain a thin layer of nitride through the vapour chemical deposition m...
Objectives: Titanium nitride (TiN) coating has been proposed as an adjunctive surface treatment aime...
Copyright © 2012 Jin Huang et al. This is an open access article distributed under the Creative Comm...
In order to improve a corrosion resistance and biocompatibility of NiTi shape memory alloys, the sur...
Ti and its alloys exhibit combination of unique properties for biomedical applications, however thei...
Atomic layer deposition (ALD) is investigated as a process to produce inorganic metallic bio-adhesiv...
Titanium nitride films were deposited by reactive magnetron sputtering on Si (100) wafers, glass and...
Coating of Ti-6Al-4V alloy substrates with TiN/Ti multi-layered films by magnetron sputtering in Ar...
[[abstract]]OBJECTIVE: To evaluate the cytotoxicity of nickel-based alloy surfaces after nitride fil...
International audienceCurrent research directions with the aim of extending the applications of tita...
This work studies the effect that argon and nitrogen atmospheres have on the structure, phase compos...
Ti–Si–C–ON films were deposited by DC reactive magnetron sputtering using different partial pressure...
This work aims to study the cytocompatibility of protective coatings obtained in argon and nitrogen ...
In the study, gradient coatings with a nanometer thickness were successfully synthesized from Ti/Ni/...
A gradient magnetron-sputtered three-layer laminated Ti–Ni–Ti coating is formed by the method of rea...
The experiments conducted to obtain a thin layer of nitride through the vapour chemical deposition m...
Objectives: Titanium nitride (TiN) coating has been proposed as an adjunctive surface treatment aime...
Copyright © 2012 Jin Huang et al. This is an open access article distributed under the Creative Comm...
In order to improve a corrosion resistance and biocompatibility of NiTi shape memory alloys, the sur...
Ti and its alloys exhibit combination of unique properties for biomedical applications, however thei...
Atomic layer deposition (ALD) is investigated as a process to produce inorganic metallic bio-adhesiv...
Titanium nitride films were deposited by reactive magnetron sputtering on Si (100) wafers, glass and...
Coating of Ti-6Al-4V alloy substrates with TiN/Ti multi-layered films by magnetron sputtering in Ar...
[[abstract]]OBJECTIVE: To evaluate the cytotoxicity of nickel-based alloy surfaces after nitride fil...
International audienceCurrent research directions with the aim of extending the applications of tita...
This work studies the effect that argon and nitrogen atmospheres have on the structure, phase compos...
Ti–Si–C–ON films were deposited by DC reactive magnetron sputtering using different partial pressure...