Process variations are a major concern in today's chip design since they can significantly degrade chip performance. To predict such degradation, existing circuit and MEMS simulators rely on Monte Carlo algorithms, which are typically too slow. Therefore, novel fast stochastic simulators are highly desired. This paper first reviews our recently developed stochastic testing simulator that can achieve speedup factors of hundreds to thousands over Monte Carlo. Then, we develop a fast hierarchical stochastic spectral simulator to simulate a complex circuit or system consisting of several blocks. We further present a fast simulation approach based on anchored ANOVA (analysis of variance) for some design problems with many process variations. Thi...
One of the most notable features of nanometer scale CMOS technology is the increasing magnitude of v...
This thesis presents a set of tools and methodologies that perform fast stochastic characterization ...
Variations of process parameters have an important impact on reliability and yield in deep sub micro...
Process variations are a major concern in today's chip design since they can significantly degrade c...
Thesis: Ph. D., Massachusetts Institute of Technology, Department of Electrical Engineering and Comp...
Hierarchical uncertainty quantification can reduce the computational cost of stochastic circuit simu...
Due to significant manufacturing process variations, the performance of integrated circuits (ICs) ha...
Uncertainties have become a major concern in integrated circuit design. In order to avoid the huge n...
Uncertainty quantification has become an important task and an emerging topic in many engineering fi...
A time-domain methodology for statistical simulation of nonlinear dynamic integrated circuits with a...
This paper presents a methodology for statistical simulation of non-linear integrated circuits affec...
In the past few decades, the semiconductor industry kept shrinking the feature size of CMOS transist...
In today's semiconductor technology, the size of a transistor is made smaller and smaller. One of th...
This paper presents a methodology for statistical simulation of non-linear integrated circuits affec...
Accurate timing analysis of digital integrated circuits is becoming harder to achieve with current a...
One of the most notable features of nanometer scale CMOS technology is the increasing magnitude of v...
This thesis presents a set of tools and methodologies that perform fast stochastic characterization ...
Variations of process parameters have an important impact on reliability and yield in deep sub micro...
Process variations are a major concern in today's chip design since they can significantly degrade c...
Thesis: Ph. D., Massachusetts Institute of Technology, Department of Electrical Engineering and Comp...
Hierarchical uncertainty quantification can reduce the computational cost of stochastic circuit simu...
Due to significant manufacturing process variations, the performance of integrated circuits (ICs) ha...
Uncertainties have become a major concern in integrated circuit design. In order to avoid the huge n...
Uncertainty quantification has become an important task and an emerging topic in many engineering fi...
A time-domain methodology for statistical simulation of nonlinear dynamic integrated circuits with a...
This paper presents a methodology for statistical simulation of non-linear integrated circuits affec...
In the past few decades, the semiconductor industry kept shrinking the feature size of CMOS transist...
In today's semiconductor technology, the size of a transistor is made smaller and smaller. One of th...
This paper presents a methodology for statistical simulation of non-linear integrated circuits affec...
Accurate timing analysis of digital integrated circuits is becoming harder to achieve with current a...
One of the most notable features of nanometer scale CMOS technology is the increasing magnitude of v...
This thesis presents a set of tools and methodologies that perform fast stochastic characterization ...
Variations of process parameters have an important impact on reliability and yield in deep sub micro...