Aggregation-induced emission poly(meth)acrylates for photopatterning via wavelength-dependent visible-light-regulated controlled radical polymerization in batch and flow conditions

A robust wavelength-dependent visible-light-regulated reversible-deactivation radical polymerization protocol is first reported for the batch preparation of >20 aggregation-induced emission (AIE)-active polyacrylates and polymethacrylates. The resulting polymers possess narrow molar mass distributions (Đ ≈ 1.09–1.25) and high end-group fidelity at high monomer conversions (mostly >95%). This demonstrated control provides facile access to the in situ generation of complex sequence-defined tetrablock copolymers in one reactor, even while chain extending from less reactive monomers. Polymerizations can be successfully carried out under various irradiation conditions, including using UV, blue, green, and red LED light with more disperse polymers obtained at the longer, less energetic, wavelengths. We observe a red shift and wavelength dependence for the most efficient polymerization using LED illumination in a polymerization reaction. We find that the absorption of the copper(II) complex is not a reliable guide to reaction conditions. Moreover, the reported protocol is readily translated to a flow setup. The prepared AIE-active polymers are demonstrated to exhibit good photopatterning, making them promising materials for applications in advanced optoelectronic devices