The paper shows, for the first time, the prospects of treatment with a quasi-equilibrium low-temperature nitrogen plasma in an open atmosphere for the formation of super-hard, super-hydrophobic TiN/TiO2 composite coatings with pronounced Raman-enhancement properties. X-ray diffractometry (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), and Raman spectroscopy, as well as the analysis of hardness and moisture-resistance properties, are used as analytical research methods. During plasma treatment of titanium films on sapphire with a mass average temperature of 4–6 kK, an X-ray amorphous hydrophilic titanium oxide film with a low nitrogen content is formed. The nitrogen content in titanium oxide films increases with inc...
The properties of hydrophilicity or hydrophobicity of materials are defined mainly, though not exclu...
International audienceThe diffusion of nitrogen into Ti silicide films allows the performance of com...
A comprehensive study of nonstoichiometry titanium oxide thin films (TiO x , 0.3≤x≤2) prepared by io...
The authors report on the role of various reactive gases on the structure and properties of TiN thin...
TiO2 and nitrogen-containing TiO2 thin films were deposited on glass and silicon wafer substrates us...
Titanium alloy Ti-6Al-7Nb was plasma nitrided using inductively coupled RF Plasma with 100% Nitrogen...
Titanium alloy Ti-6Al-7Nb was plasma nitrided using inductively coupled RF Plasma with 100% Nitrogen...
Plasma-immersion ion implantation (PIII) is a potent method to obtain hard and wear-resistant surfac...
Titanium dioxide thin films are durable, chemically stable, have a high refractive index and good el...
AbstractTitanium nitride coatings on 316L stainless steel (S. S) were obtained by plasma surface all...
Owing to its singular and (to some extend) adaptable characteristics, titanium oxynitride (TixOyNz) ...
Extremely thin titanium nitride (TiN) barrier layers for Cu based interconnects were deposited using...
Ti-6Al-4V was plasma nitrided using several N2/H2 ratios and substrate temperatures. In order to inv...
Abstract In this work, the development of a new crystallization technique is reported...
International audienceThis study reports on the properties of nitrogen doped titanium dioxide (TiO 2...
The properties of hydrophilicity or hydrophobicity of materials are defined mainly, though not exclu...
International audienceThe diffusion of nitrogen into Ti silicide films allows the performance of com...
A comprehensive study of nonstoichiometry titanium oxide thin films (TiO x , 0.3≤x≤2) prepared by io...
The authors report on the role of various reactive gases on the structure and properties of TiN thin...
TiO2 and nitrogen-containing TiO2 thin films were deposited on glass and silicon wafer substrates us...
Titanium alloy Ti-6Al-7Nb was plasma nitrided using inductively coupled RF Plasma with 100% Nitrogen...
Titanium alloy Ti-6Al-7Nb was plasma nitrided using inductively coupled RF Plasma with 100% Nitrogen...
Plasma-immersion ion implantation (PIII) is a potent method to obtain hard and wear-resistant surfac...
Titanium dioxide thin films are durable, chemically stable, have a high refractive index and good el...
AbstractTitanium nitride coatings on 316L stainless steel (S. S) were obtained by plasma surface all...
Owing to its singular and (to some extend) adaptable characteristics, titanium oxynitride (TixOyNz) ...
Extremely thin titanium nitride (TiN) barrier layers for Cu based interconnects were deposited using...
Ti-6Al-4V was plasma nitrided using several N2/H2 ratios and substrate temperatures. In order to inv...
Abstract In this work, the development of a new crystallization technique is reported...
International audienceThis study reports on the properties of nitrogen doped titanium dioxide (TiO 2...
The properties of hydrophilicity or hydrophobicity of materials are defined mainly, though not exclu...
International audienceThe diffusion of nitrogen into Ti silicide films allows the performance of com...
A comprehensive study of nonstoichiometry titanium oxide thin films (TiO x , 0.3≤x≤2) prepared by io...