Spray‐drying is a scalable process enabling one to assemble freely chosen nanoparticles into supraparticles. Atomic layer deposition (ALD) allows for controlled thin film deposition of a vast variety of materials including exotic ones that can hardly be synthesized by wet chemical methods. The properties of coated supraparticles are defined not only by the nanoparticle material chosen and the nanostructure adjusted during spray‐drying but also by surface functionalities modified by ALD, if ALD is capable of modifying not only the outer surfaces but also surfaces buried inside the porous supraparticle. Simultaneously, surface accessibility in the porous supraparticles must be ensured to make use of all functionalized surfaces. In this work, ...
In recent years, atomic layer deposition (ALD) is widely used for surface modification of materials ...
© 2019, © 2019 The Author(s). Published by National Institute for Materials Science in partnership w...
Atomic layer deposition (ALD) is a cyclic process which relies on sequential self-terminating reacti...
Spray‐drying is a scalable process enabling one to assemble freely chosen nanoparticles into suprapa...
Atomic layer deposition (ALD) is a self-limited growth method which relies on sequential reactions o...
The goal of this work is to explore atomic layer deposition (ALD) as a thin film coating technique t...
Atomic and molecular layer deposition (ALD and MLD, respectively) techniques are examples of self-as...
The morphology, size, and surface properties of pharmaceutical particles form an essential role in t...
There is strong demands to functionalize nanoparticles for many different industrial and scientific ...
Nanoparticles are increasingly applied in a range of fields, such as electronics, catalysis, energy ...
Over the course of this semester understanding of the theory and application of Atomic Layer Deposit...
Atomic layer deposition (ALD) is a vapor phase technique capable of producing a variety of materials...
In the past decade, nanopores have been developed extensively for various potential applications, an...
ABSTRACT OF THE DISSERTATION Nucleation and Growth of Atomic Layer Deposition films: Effect of Subst...
The morphology, size, and surface properties of pharmaceutical particles form an essential role in t...
In recent years, atomic layer deposition (ALD) is widely used for surface modification of materials ...
© 2019, © 2019 The Author(s). Published by National Institute for Materials Science in partnership w...
Atomic layer deposition (ALD) is a cyclic process which relies on sequential self-terminating reacti...
Spray‐drying is a scalable process enabling one to assemble freely chosen nanoparticles into suprapa...
Atomic layer deposition (ALD) is a self-limited growth method which relies on sequential reactions o...
The goal of this work is to explore atomic layer deposition (ALD) as a thin film coating technique t...
Atomic and molecular layer deposition (ALD and MLD, respectively) techniques are examples of self-as...
The morphology, size, and surface properties of pharmaceutical particles form an essential role in t...
There is strong demands to functionalize nanoparticles for many different industrial and scientific ...
Nanoparticles are increasingly applied in a range of fields, such as electronics, catalysis, energy ...
Over the course of this semester understanding of the theory and application of Atomic Layer Deposit...
Atomic layer deposition (ALD) is a vapor phase technique capable of producing a variety of materials...
In the past decade, nanopores have been developed extensively for various potential applications, an...
ABSTRACT OF THE DISSERTATION Nucleation and Growth of Atomic Layer Deposition films: Effect of Subst...
The morphology, size, and surface properties of pharmaceutical particles form an essential role in t...
In recent years, atomic layer deposition (ALD) is widely used for surface modification of materials ...
© 2019, © 2019 The Author(s). Published by National Institute for Materials Science in partnership w...
Atomic layer deposition (ALD) is a cyclic process which relies on sequential self-terminating reacti...