The forming process, which corresponds to the activation of the switching filament in Resistive Random Access Memory (RRAM) arrays, has a strong impact on the cells’ performances. In this paper we characterize and compare different pulse forming techniques in terms of forming time, yield and cell-to-cell variability on 4 kbits RRAM arrays. Moreover, post-forming modeling during Reset operation of correctly working and over formed cells has been performed. An incremental form and verify technique, based on a sequence of trapezoidal waveforms with increasing voltages followed by a verify operation that terminates when the expected switching behavior has been achieved, showed the best results. This procedure narrows the post-forming current di...
Achieving a reliable multi-level operation in resistive random access memory (RRAM) arrays is curren...
In this work, a comparison between 1T-1R RRAM arrays, manufactured either with amorphous or poly-cry...
In this paper, key aspects of the electroforming in resistive-RAM cells with HfO2 are addressed. Spe...
In this work, cells behavior during forming is monitored through an incremental pulse and verify alg...
In this letter, we propose an effective route to reduce the cell-to-cell variability in 1T-1R-based ...
The impact of temperature during the forming operation on the electrical cells performance and the p...
The intercell variability of the initial state and the impact of dc and pulse forming on intercell v...
Resistive random access memory (RRAM) is a promising candidate for the next-generation non-volatile ...
Current state-of-the-art memory technologies such as FLASH, Static Random Access Memory (SRAM) and D...
Producción CientíficaA crucial step in order to achieve fast and low-energy switching operations in ...
[[abstract]]Over the past decade, the resistive memory device known as RRAM has been studied extensi...
A crucial step in order to achieve fast and low-energy switching operations in resistive random acce...
In this work key aspects of the electroforming in RRAM cells with HfO2 oxide and Pt electrodes are a...
In this work, a comparison between 1T-1R RRAM 4kbits arrays manufactured either with amorphous or po...
We firstly propose a novel U-shape resistive cell structure which is the best fit for generating low...
Achieving a reliable multi-level operation in resistive random access memory (RRAM) arrays is curren...
In this work, a comparison between 1T-1R RRAM arrays, manufactured either with amorphous or poly-cry...
In this paper, key aspects of the electroforming in resistive-RAM cells with HfO2 are addressed. Spe...
In this work, cells behavior during forming is monitored through an incremental pulse and verify alg...
In this letter, we propose an effective route to reduce the cell-to-cell variability in 1T-1R-based ...
The impact of temperature during the forming operation on the electrical cells performance and the p...
The intercell variability of the initial state and the impact of dc and pulse forming on intercell v...
Resistive random access memory (RRAM) is a promising candidate for the next-generation non-volatile ...
Current state-of-the-art memory technologies such as FLASH, Static Random Access Memory (SRAM) and D...
Producción CientíficaA crucial step in order to achieve fast and low-energy switching operations in ...
[[abstract]]Over the past decade, the resistive memory device known as RRAM has been studied extensi...
A crucial step in order to achieve fast and low-energy switching operations in resistive random acce...
In this work key aspects of the electroforming in RRAM cells with HfO2 oxide and Pt electrodes are a...
In this work, a comparison between 1T-1R RRAM 4kbits arrays manufactured either with amorphous or po...
We firstly propose a novel U-shape resistive cell structure which is the best fit for generating low...
Achieving a reliable multi-level operation in resistive random access memory (RRAM) arrays is curren...
In this work, a comparison between 1T-1R RRAM arrays, manufactured either with amorphous or poly-cry...
In this paper, key aspects of the electroforming in resistive-RAM cells with HfO2 are addressed. Spe...