Recently, the superhardness of rhenium diboride films was reported. In this study the first successful preparation and characterization of ruthenium boride films is presented. The morphology, topography, microstructure and hardness of films, prepared by pulsed laser deposition, were investigated. The films, which are 0.7 μm thick, have a dense grain texture, and are composed of two phases Ru2B3 (main phase, 65% volume fraction) and RuB2 (35%). The RuB2 phase does not show any preferred orientation, while Ru2B3 is textured preferentially along the (1 1 4) and (1 0 5) directions, with crystallite growth parallel within 1.9° of average mismatch. The composite Vickers microhardness of the film–substrate systems was measured, and the intrinsic h...
Ultra-incompressible and superhard materials are good candidates for applications in cutting, grindi...
Ruthenium (Ru) thin films were deposited by pulsed chemical vapor deposition with precursors bis(N,N...
PECVD and PEALD of ruthenium films using RuEtcp(2) as a precursor and N-2/H-2/Ar plasma as a reducin...
Recently, the superhardness of rhenium diboride films was reported. In this study the first successf...
Very recently, the superhard properties of rhenium and ruthenium boride films were reported, this re...
Recently, the superhardness of rhenium diboride was discovered. This study presents a first successf...
Recently, the superhardness of rhenium diboride was discovered. This study presents a first successf...
The study was aimed at the hardness determination of thin ZrB2 films produced on pure titanium subst...
Ruthenium (Ru) films on rolling-assisted biaxially textured Ni substrates (RABiTs) were deposited by...
High hardness materials are used for a multitude of applications, ranging from drill bits and saw bl...
Attempts to synthesize and/or theoretically predict new superhard materials are the subject of an in...
The process characteristics, the surface chemistry, and the resulting film properties of Ru deposite...
diboride (ReB2) at ambient pressure. We show that ReB2, first synthesized at ambient pressure 45 yea...
High-density ruthenium (Ru) thin films were deposited using Ru(EtCp)2 (bis(ethylcyclopentadienyl)rut...
We report approaches to grow ultrathin Ru films for application as a seed layer and Cu diffusion bar...
Ultra-incompressible and superhard materials are good candidates for applications in cutting, grindi...
Ruthenium (Ru) thin films were deposited by pulsed chemical vapor deposition with precursors bis(N,N...
PECVD and PEALD of ruthenium films using RuEtcp(2) as a precursor and N-2/H-2/Ar plasma as a reducin...
Recently, the superhardness of rhenium diboride films was reported. In this study the first successf...
Very recently, the superhard properties of rhenium and ruthenium boride films were reported, this re...
Recently, the superhardness of rhenium diboride was discovered. This study presents a first successf...
Recently, the superhardness of rhenium diboride was discovered. This study presents a first successf...
The study was aimed at the hardness determination of thin ZrB2 films produced on pure titanium subst...
Ruthenium (Ru) films on rolling-assisted biaxially textured Ni substrates (RABiTs) were deposited by...
High hardness materials are used for a multitude of applications, ranging from drill bits and saw bl...
Attempts to synthesize and/or theoretically predict new superhard materials are the subject of an in...
The process characteristics, the surface chemistry, and the resulting film properties of Ru deposite...
diboride (ReB2) at ambient pressure. We show that ReB2, first synthesized at ambient pressure 45 yea...
High-density ruthenium (Ru) thin films were deposited using Ru(EtCp)2 (bis(ethylcyclopentadienyl)rut...
We report approaches to grow ultrathin Ru films for application as a seed layer and Cu diffusion bar...
Ultra-incompressible and superhard materials are good candidates for applications in cutting, grindi...
Ruthenium (Ru) thin films were deposited by pulsed chemical vapor deposition with precursors bis(N,N...
PECVD and PEALD of ruthenium films using RuEtcp(2) as a precursor and N-2/H-2/Ar plasma as a reducin...