We report on the fabrication of a micrometer-size movable light emitting area in a GaAs/AlAs quantum well resonant tunneling p-i-n diode. The spatial position of the micrometer-size light emitting area shifts linearly with increasing applied bias, up to 30 mu m for a bias increment of 0.2 V. Also, the simultaneous resonant tunneling injection of both electrons and holes into the quantum well states is achieved at specific positions of the diode, thus resulting in a tenfold increase of the electroluminescence intensity. (C) 2013 AIP Publishing LLC
Proceedings of SPIE - The International Society for Optical Engineering2321104-106PSIS
We investigate carrier dynamics in optically excited n-i-n GaAs/(AlGa)As resonant tunneling diodes t...
The electroluminescence spectrum and current-voltage characteristics of a forward biased triple-barr...
We report on the fabrication of a micrometer-size movable light emitting area in a GaAs/AlAs quantum...
We have fabricated GaAs/AlAs p‐i‐n double‐barrier resonant tunneling diodes with lateral dimensions ...
The incorporation of an AlAs/GaAs resonant tunneling structure inside a GaAs p-n junction leads to s...
We create a reservoir of hole traps in a resonant tunneling light emitting diode by etching the p-ty...
Resonant-tunneling light-emitting diodes contain three regions where charges accumulate during devic...
The electrical and optical properties of an n-oped triple barrier resonant tunneling diode are inves...
We explore the nature of the electroluminescence (EL) emission of purely n-doped GaAs/AlGaAs resonan...
The electroluminescence properties of several resonant tunneling single quantum well structures are ...
A pnp bipolar resonant tunneling transistor is realized using a base consisting of an n-type modulat...
The hole distribution and electroluminescence property improvement by adjusting the relative positio...
Transport properties of a GaAs/AlAs superlattice-like double barrier diode are studied in this work ...
MBE regrowth on patterned np-GaAs wafers has been used to fabricate GaAs/AlGaAs double barrier reson...
Proceedings of SPIE - The International Society for Optical Engineering2321104-106PSIS
We investigate carrier dynamics in optically excited n-i-n GaAs/(AlGa)As resonant tunneling diodes t...
The electroluminescence spectrum and current-voltage characteristics of a forward biased triple-barr...
We report on the fabrication of a micrometer-size movable light emitting area in a GaAs/AlAs quantum...
We have fabricated GaAs/AlAs p‐i‐n double‐barrier resonant tunneling diodes with lateral dimensions ...
The incorporation of an AlAs/GaAs resonant tunneling structure inside a GaAs p-n junction leads to s...
We create a reservoir of hole traps in a resonant tunneling light emitting diode by etching the p-ty...
Resonant-tunneling light-emitting diodes contain three regions where charges accumulate during devic...
The electrical and optical properties of an n-oped triple barrier resonant tunneling diode are inves...
We explore the nature of the electroluminescence (EL) emission of purely n-doped GaAs/AlGaAs resonan...
The electroluminescence properties of several resonant tunneling single quantum well structures are ...
A pnp bipolar resonant tunneling transistor is realized using a base consisting of an n-type modulat...
The hole distribution and electroluminescence property improvement by adjusting the relative positio...
Transport properties of a GaAs/AlAs superlattice-like double barrier diode are studied in this work ...
MBE regrowth on patterned np-GaAs wafers has been used to fabricate GaAs/AlGaAs double barrier reson...
Proceedings of SPIE - The International Society for Optical Engineering2321104-106PSIS
We investigate carrier dynamics in optically excited n-i-n GaAs/(AlGa)As resonant tunneling diodes t...
The electroluminescence spectrum and current-voltage characteristics of a forward biased triple-barr...