Atomic layer deposition of PbCl2, PbBr2 and mixed lead halide (Cl, Br, I) PbXnY2-n thin films
- Popov, Georgi
- Bacic, Goran
- Van Dijck, Charlotte
- Junkers, Laura S.
- Weiss, Alexander
- Mattinen, Miika
- Vihervaara, Anton
- Chundak, Mykhailo
- Jalkanen, Pasi
- Mizohata, Kenichiro
- Leskela, Markku
- Masuda, Jason D.
- Barry, Sean T.
- Ritala, Mikko
- Kemell, Marianna
Publication date
October 2022
DOI Publisher
Royal Society of Chemistry Language
EnglishAbstract
Atomic layer deposition offers outstanding film uniformity and conformality on substrates with high aspect ratio features. These qualities are essential for mixed-halide perovskite films applied in tandem solar cells, transistors and light-emitting diodes. The optical and electronic properties of mixed-halide perovskites can be adjusted by adjusting the ratios of different halides. So far ALD is only capable of depositing iodine-based halide perovskites whereas other halide processes are lacking. We describe six new low temperature (Peer reviewe
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