255 pagesContinued improvements in the efficiency and speed of computation and telecommunication requires leveraging the properties of novel materials and materials interfaces. Superconductivity, a phenomenon that until now has not seen widespread application in microelectronic devices, appears poised for extensive implementation in technologies such as single flux quantum (SFQ) digital logic and Josephson junction-based quantum computing. The development of these technologies requires addressing outstanding materials challenges, such as realizing new materials and devices to enable improvements such as increased circuit density for SFQ circuits and low microwave noise Josephson junctions for enhanced coherence time superconducting qubits. ...
International audienceIn this paper, we study the crystalline properties and semiconducting critical...
p-Type doping represents a key step towards III-nitride (InN, GaN, AlN) optoelectronic devices. In t...
p-Type doping represents a key step towards III-nitride (InN, GaN, AlN) optoelectronic devices. In t...
This is a study of the growth of titanium-nitride (TiN) by plasma assisted molecular beam epitaxy (M...
In the past several decades, nitride-based semiconductors have impacted everyday life in sectors suc...
In the past decades, III-nitride semiconductor compounds have attracted an increasing amount of inte...
International audienceIn this paper, we study the impact of using III-nitride semiconductors (GaN, A...
Through the history of mankind, novel materials have played a key role in techno- logical progr...
The suitability of AlxGa1-xN epi-layer to deposit onto ultra-thin NbN films has been demonstrated fo...
Abstract NbN superconductor and wide band gap AlN thin films were deposited using sputtering at roo...
The III-nitride semiconductor materials have wide direct bandgap ranging from 6.2 eV (AlN); through ...
220 pagesUltrawide bandgap (UWBG) semiconductors, especially those in the III-nitride family of mate...
The III-nitride semiconductors, including AlN, InN, GaN, and BN have been demonstrated as technologi...
The industrial level technologies including molecular beam epitaxy and submicron planar processing a...
The lack of appropriate substrates has delayed the realisation of devices based on III-nitrides. Cur...
International audienceIn this paper, we study the crystalline properties and semiconducting critical...
p-Type doping represents a key step towards III-nitride (InN, GaN, AlN) optoelectronic devices. In t...
p-Type doping represents a key step towards III-nitride (InN, GaN, AlN) optoelectronic devices. In t...
This is a study of the growth of titanium-nitride (TiN) by plasma assisted molecular beam epitaxy (M...
In the past several decades, nitride-based semiconductors have impacted everyday life in sectors suc...
In the past decades, III-nitride semiconductor compounds have attracted an increasing amount of inte...
International audienceIn this paper, we study the impact of using III-nitride semiconductors (GaN, A...
Through the history of mankind, novel materials have played a key role in techno- logical progr...
The suitability of AlxGa1-xN epi-layer to deposit onto ultra-thin NbN films has been demonstrated fo...
Abstract NbN superconductor and wide band gap AlN thin films were deposited using sputtering at roo...
The III-nitride semiconductor materials have wide direct bandgap ranging from 6.2 eV (AlN); through ...
220 pagesUltrawide bandgap (UWBG) semiconductors, especially those in the III-nitride family of mate...
The III-nitride semiconductors, including AlN, InN, GaN, and BN have been demonstrated as technologi...
The industrial level technologies including molecular beam epitaxy and submicron planar processing a...
The lack of appropriate substrates has delayed the realisation of devices based on III-nitrides. Cur...
International audienceIn this paper, we study the crystalline properties and semiconducting critical...
p-Type doping represents a key step towards III-nitride (InN, GaN, AlN) optoelectronic devices. In t...
p-Type doping represents a key step towards III-nitride (InN, GaN, AlN) optoelectronic devices. In t...