Interconnected oscillations of current, lattice temperature and electron-hole pair concentration were observed in silicon on insulator (SOI) structures upon heating with current at extremely high power. They occur because of the joint action of two competing mechanisms: temperature dependent thermal generation of electron-hole pairs and pair concentration decreasing by current flowing in silicon film through a non-uniform temperature field
This is the first consistent simulation result to show that the quantization of carrier energy state...
Fig.l shows the structure of a normal SOI M O S F E T. The device is built in a silicon island. Ex-c...
Cooling of electrons in a heavily doped silicon by quasiparticle tunneling using a superconductor–se...
Interacting oscillations of the current, lattice temperature, and concentration of thermally generat...
Energy flow rate in degenerate n-type silicon-on-insulator (SOI) film is studied at low temperatures...
The influence of carrier concentration in silicon-on-insulator film on the thermal characteristics o...
Silicon-on-insulator (SOI) technology presents one way of fabricating semiconductor devices on an in...
The high temperature characteristics of devices and circuits realized in complementary metal oxide s...
Standard bulk CMOS technology targets operating temperatures of not more than 175°C. Silicon-on-insu...
SOI (silicon on insulator) samples were produced by large dose (1.8 - 2.5 x 10(18)/cm2) oxygen ion i...
The paper reviews the problems related to BOX high-temperature instability in SOI structures and MOS...
This paper examines the influence of the static and dynamic electrothermal behaviour of silicon-on-i...
The electrical characteristics of devices and circuits realized in CMOS technology on silicon-on-ins...
This work investigates and demonstrates the potential of Silicon-On-Insulator (SOI) MOSFETs for high...
The silicon-on-insulator (SOI) CMOS technology is one of the best candidates for high-temperature ap...
This is the first consistent simulation result to show that the quantization of carrier energy state...
Fig.l shows the structure of a normal SOI M O S F E T. The device is built in a silicon island. Ex-c...
Cooling of electrons in a heavily doped silicon by quasiparticle tunneling using a superconductor–se...
Interacting oscillations of the current, lattice temperature, and concentration of thermally generat...
Energy flow rate in degenerate n-type silicon-on-insulator (SOI) film is studied at low temperatures...
The influence of carrier concentration in silicon-on-insulator film on the thermal characteristics o...
Silicon-on-insulator (SOI) technology presents one way of fabricating semiconductor devices on an in...
The high temperature characteristics of devices and circuits realized in complementary metal oxide s...
Standard bulk CMOS technology targets operating temperatures of not more than 175°C. Silicon-on-insu...
SOI (silicon on insulator) samples were produced by large dose (1.8 - 2.5 x 10(18)/cm2) oxygen ion i...
The paper reviews the problems related to BOX high-temperature instability in SOI structures and MOS...
This paper examines the influence of the static and dynamic electrothermal behaviour of silicon-on-i...
The electrical characteristics of devices and circuits realized in CMOS technology on silicon-on-ins...
This work investigates and demonstrates the potential of Silicon-On-Insulator (SOI) MOSFETs for high...
The silicon-on-insulator (SOI) CMOS technology is one of the best candidates for high-temperature ap...
This is the first consistent simulation result to show that the quantization of carrier energy state...
Fig.l shows the structure of a normal SOI M O S F E T. The device is built in a silicon island. Ex-c...
Cooling of electrons in a heavily doped silicon by quasiparticle tunneling using a superconductor–se...